Issued Patents All Time
Showing 151–175 of 175 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5773100 | PECVD of silicon nitride films | David N. Wang, John M. White, Dan Maydan | 1998-06-30 |
| 5712327 | Soft gas permeable contact lens having improved clinical performance | Sing-Hsiung Chang | 1998-01-27 |
| 5695568 | Chemical vapor deposition chamber | Ashok Sinha, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1997-12-09 |
| 5565382 | Process for forming tungsten silicide on semiconductor wafer using dichlorosilane gas | Meng Chu Tseng, Susan Telford | 1996-10-15 |
| 5516367 | Chemical vapor deposition chamber with a purge guide | Lawrence Chung-Lai Lei, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Ashok Sinha | 1996-05-14 |
| 5510297 | Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor | Susan Telford, Michio Aruga | 1996-04-23 |
| 5482749 | Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein | Susan Telford, Michio Aruga | 1996-01-09 |
| 5449410 | Plasma processing apparatus | Cissy Leung | 1995-09-12 |
| 5421401 | Compound clamp ring for semiconductor wafers | Semyon Sherstinsky, Charles C. Harris, Alan F. Morrison, Virendra V. Rana, James Roberts +2 more | 1995-06-06 |
| 5356835 | Method for forming low resistance and low defect density tungsten contacts to silicon semiconductor wafer | Sasson Somekh, Jaim Nulman | 1994-10-18 |
| 5326725 | Clamping ring and susceptor therefor | Semyon Sherstinsky, Charles C. Harris, Dale R. Du Bois, James Roberts, Susan Telford +3 more | 1994-07-05 |
| 5316278 | Clamping ring apparatus for processing semiconductor wafers | Semyon Sherstinsky, Charles C. Harris, Alfred Mak, James Roberts, Simon W. Tam +1 more | 1994-05-31 |
| 5250467 | Method for forming low resistance and low defect density tungsten contacts to silicon semiconductor wafer | Sasson Somekh, Jaim Nulman | 1993-10-05 |
| 5219485 | Materials and methods for etching silicides, polycrystalline silicon and polycides | David N. Wang, T. K. Leong, deceased, Peter Leong | 1993-06-15 |
| 5215619 | Magnetic field-enhanced plasma etch reactor | David Cheng, Dan Maydan, Sasson Somekh, Kenneth R. Stalder, Dana L. Andrews +4 more | 1993-06-01 |
| 5213650 | Apparatus for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer | David N. Wang, Lawrence Chung-Lai Lei, Cissy Leung | 1993-05-25 |
| 5207836 | Cleaning process for removal of deposits from the susceptor of a chemical vapor deposition apparatus | — | 1993-05-04 |
| 5201990 | Process for treating aluminum surfaces in a vacuum apparatus | Ashok Sinha, Turgut Sahin, Alfred Mak, Cissy Leung | 1993-04-13 |
| 5075256 | Process for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer | David N. Wang, Lawrence Chung-Lai Lei, Cissy Leung | 1991-12-24 |
| 5043299 | Process for selective deposition of tungsten on semiconductor wafer | David N. Wang | 1991-08-27 |
| 5028565 | Process for CVD deposition of tungsten layer on semiconductor wafer | Cissy Leung, David N. Wang, David Cheng | 1991-07-02 |
| 4962049 | Process for the plasma treatment of the backside of a semiconductor wafer | David Cheng | 1990-10-09 |
| 4960488 | Reactor chamber self-cleaning process | Kam S. Law, Cissy Leung, Ching Chiang Tang, Kenneth S. Collins, Jerry Wong +1 more | 1990-10-02 |
| 4854263 | Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films | David N. Wang, John M. White, Dan Maydan | 1989-08-08 |
| 4842683 | Magnetic field-enhanced plasma etch reactor | David Cheng, Dan Maydan, Sasson Somekh, Kenneth R. Stalder, Dana L. Andrews +4 more | 1989-06-27 |