DE

Daniel C. Edelstein

IBM: 293 patents #76 of 70,183Top 1%
TE Tessera: 8 patents #54 of 271Top 20%
Globalfoundries: 6 patents #578 of 4,424Top 15%
GU Globalfoundries U.S.: 2 patents #5 of 211Top 3%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
TC Toshiba America Electronic Components: 2 patents #14 of 77Top 20%
AM AMD: 2 patents #3,994 of 9,279Top 45%
FS Freeescale Semiconductor: 1 patents #2,021 of 3,767Top 55%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
📍 White Plains, NY: #2 of 917 inventorsTop 1%
🗺 New York: #53 of 115,490 inventorsTop 1%
Overall (All Time): #1,168 of 4,157,543Top 1%
312
Patents All Time

Issued Patents All Time

Showing 226–250 of 312 patents

Patent #TitleCo-InventorsDate
7456074 Increasing an electrical resistance of a resistor by nitridization Arne Ballantine, Anthony K. Stamper 2008-11-25
7405147 Device and methodology for reducing effective dielectric constant in semiconductor devices Matthew E. Colburn, Edward C. Cooney, III, Timothy J. Dalton, John A. Fitzsimmons, Jeffrey P. Gambino +10 more 2008-07-29
7394110 Planar vertical resistor and bond pad resistor Douglas D. Coolbaugh, Timothy J. Dalton, Ebenezer E. Eshun, Jeffrey P. Gambino, Kevin S. Petrarca +2 more 2008-07-01
7375021 Method and structure for eliminating aluminum terminal pad material in semiconductor devices Mukta G. Farooq, Robert Hannon, Ian D. Melville 2008-05-20
7361993 Terminal pad structures and methods of fabricating same Douglas D. Coolbaugh, Ebenezer E. Eshun, Zhong-Xiang He, Robert M. Rassel, Anthony K. Stamper 2008-04-22
7351639 Increasing an electrical resistance of a resistor by oxidation or nitridization Arne Ballantine, Anthony K. Stamper 2008-04-01
7327033 Copper alloy via bottom liner Edward C. Cooney, III, John A. Fitzsimmons, Jeffrey P. Gambino, Anthony K. Stamper 2008-02-05
7276787 Silicon chip carrier with conductive through-vias and method for fabricating same Paul S. Andry, Leena Paivikki Buchwalter, Jon A. Casey, Sherif A. Goma, Raymond R. Horton +9 more 2007-10-02
7273770 Compliant passivated edge seal for low-k interconnect structures Lee M. Nicholson 2007-09-25
7271699 Changing an electrical resistance of a resistor Arne Ballantine, Cyril Cabral, Jr., Anthony K. Stamper 2007-09-18
7253100 Reducing damage to ulk dielectric during cross-linked polymer removal Ronald A. DellaGuardia, Habib Hichri, Vincent J. McGahay 2007-08-07
7129561 Tri-metal and dual-metal stacked inductors Douglas D. Coolbaugh, Robert A. Groves, Zhong-Xiang He 2006-10-31
7119018 Copper conductor Michael Lane, Stefanie Chiras, Terry A. Spooner, Robert Rosenberg 2006-10-10
7115996 Method to selectively cap interconnects with indium or tin bronzes and/or oxides thereof and the interconnect so capped Sung Kwon Kang, Maurice McGlashan-Powell, Eugene J. O'Sullivan, George F. Walker 2006-10-03
7098544 Edge seal for integrated circuit chips Lee M. Nicholson 2006-08-29
7084079 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications Richard A. Conti, Gill Yong Lee 2006-08-01
7081680 Self-aligned corrosion stop for copper C4 and wirebond Anthony K. Stamper, Judith M. Rubino, Carlos J. Sambucetti 2006-07-25
7068138 High Q factor integrated circuit inductor Panayotis Andricacos, John M. Cotte, Hariklia Deligianni, John Harold Magerlein, Kevin S. Petrarca +2 more 2006-06-27
7067437 Structures with improved interfacial strength of SiCOH dielectrics and method for preparing the same Alfred Grill, Vishnubhai V. Patel, Darryl D. Restaino 2006-06-27
7033927 Apparatus and method for thermal isolation, circuit cooling and electromagnetic shielding of a wafer Guy M. Cohen, Keith A. Jenkins, Chirag S. Patel, Lie Shan 2006-04-25
7030031 Method for forming damascene structure utilizing planarizing material coupled with diffusion barrier material William C. Wille, William J. Cote, Peter Biolsi, John Fritche, Allan Upham 2006-04-18
7015581 Low-K dielectric material system for IC application Jon A. Casey 2006-03-21
6992390 Liner with improved electromigration redundancy for damascene interconnects Baozhen Li, Timothy D. Sullivan 2006-01-31
6946716 Electroplated interconnection structures on integrated circuit chips Panayotis Andricacos, Harikilia Deligianni, John O. Dukovic, Wilma Jean Horkans, Chao-Kun Hu +4 more 2005-09-20
6878616 Low-k dielectric material system for IC application Jon A. Casey 2005-04-12