DE

Daniel C. Edelstein

IBM: 293 patents #76 of 70,183Top 1%
TE Tessera: 8 patents #54 of 271Top 20%
Globalfoundries: 6 patents #578 of 4,424Top 15%
GU Globalfoundries U.S.: 2 patents #5 of 211Top 3%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
TC Toshiba America Electronic Components: 2 patents #14 of 77Top 20%
AM AMD: 2 patents #3,994 of 9,279Top 45%
FS Freeescale Semiconductor: 1 patents #2,021 of 3,767Top 55%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
📍 White Plains, NY: #2 of 917 inventorsTop 1%
🗺 New York: #53 of 115,490 inventorsTop 1%
Overall (All Time): #1,168 of 4,157,543Top 1%
312
Patents All Time

Issued Patents All Time

Showing 251–275 of 312 patents

Patent #TitleCo-InventorsDate
6862799 Method for changing an electrical resistance of a resistor Arne Ballantine, Cyril Cabral, Jr., Anthony K. Stamper 2005-03-08
6784088 Method to selectively cap interconnects with indium or tin bronzes and/or oxides thereof and the interconnect so capped Sung Kwon Kang, Maurice McGlashan-Powell, Eugene J. O'Sullivan, George F. Walker 2004-08-31
6779711 Self-aligned corrosion stop for copper C4 and wirebond Anthony K. Stamper, Judith M. Rubino, Carlos J. Sambucetti 2004-08-24
6777809 BEOL decoupling capacitor Peter Richard Duncombe, Robert Benjamin Laibowitz, Deborah A. Neumayer, Tak H. Ning, Robert Rosenberg +1 more 2004-08-17
6746947 Post-fuse blow corrosion prevention structure for copper fuses Timothy H. Daubenspeck, Robert M. Geffken, William T. Motsiff, Anthony K. Stamper, Steven H. Voldman 2004-06-08
6743268 Chemical-mechanical planarization of barriers or liners for copper metallurgy William J. Cote, Naftali E. Lustig 2004-06-01
6740539 Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates Richard A. Conti, Prakash Dev, David M. Dobuzinsky, Gill Yong Lee, Kia-Seng Low +3 more 2004-05-25
6730984 Increasing an electrical resistance of a resistor by oxidation or nitridization Arne Ballantine, Anthony K. Stamper 2004-05-04
6709562 Method of making electroplated interconnection structures on integrated circuit chips Panayotis Andricacos, Hariklia Deligianni, John O. Dukovic, Wilma Jean Horkans, Chao-Kun Hu +4 more 2004-03-23
6647614 Method for changing an electrical resistance of a resistor Arne Ballantine, Cyril Cabral, Jr., Anthony K. Stamper 2003-11-18
6649531 Process for forming a damascene structure William J. Cote, Timothy J. Dalton, Prakash Dev, Scott D. Halle, Gill Yong Lee +1 more 2003-11-18
6646345 Method for forming Co-W-P-Au films Carlos J. Sambucetti, Judith M. Rubino, Cyryl Cabral, Jr., George F. Walker, John G. Gaudiello +1 more 2003-11-11
6632377 Chemical-mechanical planarization of metallurgy Vlasta Brusic, Paul M. Feeney, William L. Guthrie, Mark A. Jaso, Frank B. Kaufman +4 more 2003-10-14
6570256 Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates Richard A. Conti, Prakash Dev, David M. Dobuzinsky, Gill Yong Lee, Kia-Seng Low +3 more 2003-05-27
6569783 Graded composition diffusion barriers for chip wiring applications Cyprian Emeka Uzoh, Andrew H. Simon 2003-05-27
6551931 Method to selectively cap interconnects with indium or tin bronzes and/or oxides thereof and the interconnect so capped Sung Kwon Kang, Maurice McGlashan-Powell, Eugene J. O'Sullivan, George F. Walker 2003-04-22
6548901 Cu/low-k BEOL with nonconcurrent hybrid dielectric interface William J. Cote, Timothy J. Dalton, Stephen M. Gates 2003-04-15
6531412 Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications Richard A. Conti, Gill Yong Lee 2003-03-11
6525427 BEOL decoupling capacitor Peter Richard Duncombe, Robert Benjamin Laibowitz, Deborah A. Neumayer, Tak H. Ning, Robert Rosenberg +1 more 2003-02-25
6522304 Dual damascene horn antenna Arne Ballantine, James S. Nakos, Anthony K. Stamper 2003-02-18
6498385 Post-fuse blow corrosion prevention structure for copper fuses Timothy H. Daubenspeck, Robert M. Geffken, William T. Motsiff, Anthony K. Stamper, Steven H. Voldman 2002-12-24
6492259 Process for making a planar integrated circuit interconnect Bachir Dirahoui, Robert C. Greenlese, Harris C. Jones 2002-12-10
6486557 Hybrid dielectric structure for improving the stiffness of back end of the line structures Charles R. Davis, John C. Hay, Jr., Jeffrey Hedrick, Christopher V. Jahnes, Vincent J. McGahay +1 more 2002-11-26
6465376 Method and structure for improving electromigration of chip interconnects Cyprian Emeka Uzoh, Andrew H. Simon 2002-10-15
6457234 Process for manufacturing self-aligned corrosion stop for copper C4 and wirebond Judith M. Rubino, Carlos J. Sambucetti, Anthony K. Stamper 2002-10-01