Issued Patents All Time
Showing 26–50 of 123 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7915139 | CVD flowable gap fill | Chi-I Lang, Judy H. Huang, Sunil Shanker | 2011-03-29 |
| 7901539 | Apparatus and methods for transporting and processing substrates | Terry Bluck, Kevin Fairbairn, Christopher T. Lane | 2011-03-08 |
| 7888233 | Flowable film dielectric gap fill process | Vishal Gauri, Raashina Humayun, Chi-I Lang, Judy H. Huang, Sunil Shanker | 2011-02-15 |
| 7861990 | Combination awning bracket and light support system | — | 2011-01-04 |
| 7582555 | CVD flowable gap fill | Chi-I Lang, Judy H. Huang, Sunil Shanker | 2009-09-01 |
| 7560377 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2009-07-14 |
| 7524735 | Flowable film dielectric gap fill process | Vishal Gauri, Raashina Humayun, Chi-I Lang, Judy H. Huang, Sunil Shanker | 2009-04-28 |
| 7491653 | Metal-free catalysts for pulsed deposition layer process for conformal silica laminates | George D. Papasouliotis, Seon-Mee Cho, Ron Rulkens, Mihai Buretea, Dennis M. Hausmann | 2009-02-17 |
| 7311290 | Component awning and light support system | — | 2007-12-25 |
| 7244672 | Selective etching of organosilicate films over silicon oxide stop etch layers | Huong Nguyen, Li-Qun Xia, Mehul Naik | 2007-07-17 |
| 7183201 | Selective etching of organosilicate films over silicon oxide stop etch layers | Huong Nguyen, Li-Qun Xia, Mehul Naik | 2007-02-27 |
| 7105442 | Ashable layers for reducing critical dimensions of integrated circuit features | Hongching Shan, Kenny L. Doan, Jingbao Liu, Hong Dang Nguyen, Christopher Dennis Bencher +4 more | 2006-09-12 |
| 7097716 | Method for performing fluorocarbon chamber cleaning to eliminate fluorine memory effect | Huong Nguyen | 2006-08-29 |
| 7011039 | Multi-purpose processing chamber with removable chamber liner | Jonathan D. Mohn, John Joseph Helmsen | 2006-03-14 |
| 6962644 | Tandem etch chamber plasma processing system | Alexander Paterson, Valentin Todorov, Jon McChesney, Gerhard Schneider, David Palagashvili +1 more | 2005-11-08 |
| 6939434 | Externally excited torroidal plasma source with magnetic control of ion distribution | Kenneth S. Collins, Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen +1 more | 2005-09-06 |
| 6930061 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2005-08-16 |
| 6893533 | Plasma reactor having a symmetric parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2005-05-17 |
| 6888040 | Method and apparatus for abatement of reaction products from a vacuum processing chamber | Paul Shufflebotham | 2005-05-03 |
| 6879870 | Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber | Steven C. Shannon, Daniel J. Hoffman, Lee LaBlanc | 2005-04-12 |
| 6869896 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2005-03-22 |
| 6853141 | Capacitively coupled plasma reactor with magnetic plasma control | Daniel J. Hoffman, Matthew L. Miller, Jang-Gyoo Yang, Heeyeop Chae, Tetsuya Ishikawa +1 more | 2005-02-08 |
| 6849151 | Monitoring substrate processing by detecting reflectively diffracted light | John Holland, David Mui, Wei Liu | 2005-02-01 |
| 6841006 | Atmospheric substrate processing apparatus for depositing multiple layers on a substrate | Michael S. Cox, Canfeng Lai, John Parks | 2005-01-11 |
| 6829056 | Monitoring dimensions of features at different locations in the processing of substrates | John D. Holland, II, Hongqing Shan, Bryan Pu, Mohit Jain, Zhifeng Sui +5 more | 2004-12-07 |