MB

Michael Barnes

Applied Materials: 34 patents #313 of 7,310Top 5%
Lam Research: 32 patents #68 of 2,128Top 4%
IBM: 17 patents #6,502 of 70,183Top 10%
IN Intevac: 8 patents #6 of 113Top 6%
NS Novellus Systems: 8 patents #108 of 780Top 15%
BG Brooks Automation Gmbh: 3 patents #95 of 346Top 30%
DC Dorsey Gage Co.: 2 patents #3 of 6Top 50%
GE: 2 patents #13,562 of 36,430Top 40%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
📍 Shelton, CT: #1 of 439 inventorsTop 1%
🗺 Connecticut: #72 of 34,797 inventorsTop 1%
Overall (All Time): #9,401 of 4,157,543Top 1%
123
Patents All Time

Issued Patents All Time

Showing 76–100 of 123 patents

Patent #TitleCo-InventorsDate
RE37580 Guard ring electrostatic chuck John H. Keller, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. 2002-03-12
6348725 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2002-02-19
RE37541 Electrostatic chuck with reference electrode John H. Keller, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. 2002-02-05
6303523 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2001-10-16
6280563 Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma Scott Baldwin, John Holland 2001-08-28
6277237 Chamber liner for semiconductor process chambers Alan M. Schoepp, William M. Denty, Jr. 2001-08-21
6270862 Method for high density plasma chemical vapor deposition of dielectric films Brian McMillin, Huong Nguyen, Butch Berney 2001-08-07
6203657 Inductively coupled plasma downstream strip module Wenli Collison, Tuqiang Ni, Butch Berney, Wayne Vereb, Brian McMillin 2001-03-20
6170429 Chamber liner for semiconductor process chambers Alan M. Schoepp, William M. Denty, Jr. 2001-01-09
6142163 Method and apparatus for pressure control in vacuum processors Brian McMillin, Farro Kaveh 2000-11-07
6062729 Rapid IR transmission thermometry for wafer temperature sensing Tuqiang Ni 2000-05-16
6042687 Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing Vikram Singh, Brian McMillin, Tom Ni, Richard Yang 2000-03-28
6027603 Inductively coupled planar source for substantially uniform plasma flux John Holland 2000-02-22
6013155 Gas injection system for plasma processing Brian McMillin, Huong Nguyen, Tom Ni 2000-01-11
5982099 Method of and apparatus for igniting a plasma in an r.f. plasma processor Brett C. Richardson, Tuan Ngo, John Holland 1999-11-09
5975013 Vacuum plasma processor having coil with small magnetic field in its center John Holland 1999-11-02
5892198 Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same John Holland 1999-04-06
5847918 Electrostatic clamping method and apparatus for dielectric workpieces in vacuum processors Paul Shufflebotham 1998-12-08
5838529 Low voltage electrostatic clamp for substrates such as dielectric substrates Paul Shufflebotham 1998-11-17
5835334 Variable high temperature chuck for high density plasma chemical vapor deposition Brian McMillin, Butch Berney, Huong Nguyen 1998-11-10
5803107 Method and apparatus for pressure control in vacuum processors Farro Kaveh, Brett C. Richardson, Christopher H. Olson 1998-09-08
5805408 Electrostatic clamp with lip seal for clamping substrates Robert A. Maraschin, Paul Shufflebotham 1998-09-08
5800619 Vacuum plasma processor having coil with minimum magnetic field in its center John Holland 1998-09-01
5793162 Apparatus for controlling matching network of a vacuum plasma processor and memory for same John Holland 1998-08-11
5759280 Inductively coupled source for deriving substantially uniform plasma flux John Holland 1998-06-02