Issued Patents All Time
Showing 101–123 of 123 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5758680 | Method and apparatus for pressure control in vacuum processors | Farro Kaveh, Brett C. Richardson, Christopher H. Olson | 1998-06-02 |
| 5689215 | Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor | Brett C. Richardson, Tuan Ngo | 1997-11-18 |
| 5679215 | Method of in situ cleaning a vacuum plasma processing chamber | Arthur K. Yasuda | 1997-10-21 |
| 5670066 | Vacuum plasma processing wherein workpiece position is detected prior to chuck being activated | Luo Laizhong | 1997-09-23 |
| 5650032 | Apparatus for producing an inductive plasma for plasma processes | John H. Keller, John C. Forster, John E. Heidenreich, III | 1997-07-22 |
| 5612851 | Guard ring electrostatic chuck | John H. Keller, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1997-03-18 |
| 5589737 | Plasma processor for large workpieces | Neil M.P. Benjamin, John Holland, Richard D. Beer, Robert Veltrop | 1996-12-31 |
| 5561585 | Electrostatic chuck with reference electrode | John H. Keller, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1996-10-01 |
| 5543184 | Method of reducing particulates in a plasma tool through steady state flows | Dennis K. Coultas, John C. Forster, John H. Keller, Thomas E. Wicker | 1996-08-06 |
| 5535507 | Method of making electrostatic chuck with oxide insulator | John H. Keller, Joseph S. Logan, Raymond R. Ruckel, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1996-07-16 |
| 5518547 | Method and apparatus for reducing particulates in a plasma tool through steady state flows | Dennis K. Coultas, John C. Forster, John H. Keller, Thomas E. Wicker | 1996-05-21 |
| 5505816 | Etching of silicon dioxide selectively to silicon nitride and polysilicon | John H. Keller, William M. Holber, Tina J. Cotler, Jonathan D. Chapple-Sokol, Dragan Podlesnik | 1996-04-09 |
| 5467249 | Electrostatic chuck with reference electrode | John H. Keller, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1995-11-14 |
| 5463525 | Guard ring electrostatic chuck | John H. Keller, Joseph S. Logan, Robert E. Tompkins, Robert P. Westerfield, Jr. | 1995-10-31 |
| 5452510 | Method of making an electrostatic chuck with oxide insulator | Robert P. Westerfield, Jr. | 1995-09-26 |
| 5433258 | Gettering of particles during plasma processing | Dennis K. Coultas, John C. Forster, John H. Keller, James A. O'Neill | 1995-07-18 |
| 5390719 | Canopy assembly pivotable by over-height vehicle | — | 1995-02-21 |
| 5332441 | Apparatus for gettering of particles during plasma processing | Dennis K. Coultas, John C. Forster, John H. Keller, James A. O'Neill | 1994-07-26 |
| 5284549 | Selective fluorocarbon-based RIE process utilizing a nitrogen additive | Melanie M. Chow, John C. Forster, Michael Fury, Chang-Ching Kin, Harris C. Jones +2 more | 1994-02-08 |
| 5241245 | Optimized helical resonator for plasma processing | Dennis K. Coultas, JOHN FORSTER, John H. Keller | 1993-08-31 |
| 5207437 | Ceramic electrostatic wafer chuck | Dennis K. Coultas, John C. Forster, John H. Keller | 1993-05-04 |
| 5189446 | Plasma wafer processing tool having closed electron cyclotron resonance | John C. Forster, John H. Keller | 1993-02-23 |
| 5178739 | Apparatus for depositing material into high aspect ratio holes | John C. Forster, John H. Keller | 1993-01-12 |