Issued Patents All Time
Showing 51–75 of 123 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6818096 | Plasma reactor electrode | David Palagashvili | 2004-11-16 |
| 6734115 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2004-05-11 |
| 6727655 | Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber | Jon McChesney, Alex Paterson, Valentin N. Todorow, John Holland | 2004-04-27 |
| 6706138 | Adjustable dual frequency voltage dividing plasma reactor | John Holland, Alexander Paterson, Valentin Todorov, Farhad Moghadam | 2004-03-16 |
| 6694915 | Plasma reactor having a symmetrical parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2004-02-24 |
| 6692649 | Inductively coupled plasma downstream strip module | Wenli Collison, Tuqiang Ni, Butch Berney, Wayne Vereb, Brian McMillin | 2004-02-17 |
| 6685798 | Plasma reactor having a symmetrical parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2004-02-03 |
| 6660656 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2003-12-09 |
| 6626185 | Method of depositing a silicon containing layer on a semiconductor substrate | Alex Demos, Paul Shufflebotham, Huong Nguyen, Brian McMillin, Monique Ben-Dor | 2003-09-30 |
| 6617794 | Method for controlling etch uniformity | John Holland, Valentin Todorov, Mohit Jain, Alexander Paterson | 2003-09-09 |
| 6598615 | Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber | John Holland, Steve S. Y. Mak, Patrick Leahey, Jonathan D. Mohn | 2003-07-29 |
| 6596655 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2003-07-22 |
| 6583071 | Ultrasonic spray coating of liquid precursor for low K dielectric coatings | Timothy Weidman, Yunfeng Lu, Michael P. Nault, Farhad Moghadam | 2003-06-24 |
| 6569257 | Method for cleaning a process chamber | Huong Nguyen, Li-Qun Xia, Ellie Yieh | 2003-05-27 |
| 6562690 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2003-05-13 |
| 6541282 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2003-04-01 |
| 6521546 | Method of making a fluoro-organosilicate layer | Hichem M'Saad, Huong Nguyen, Farhad Moghadam | 2003-02-18 |
| 6521082 | Magnetically enhanced plasma apparatus and method with enhanced plasma uniformity and enhanced ion energy control | Hongqing Shan | 2003-02-18 |
| 6511923 | Deposition of stable dielectric films | Yaxin Wang, Thanh Pham, Farhad Moghadam | 2003-01-28 |
| 6507155 | Inductively coupled plasma source with controllable power deposition | John Holland, Valentin Todorov | 2003-01-14 |
| 6462481 | Plasma reactor having a symmetric parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2002-10-08 |
| 6414648 | Plasma reactor having a symmetric parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2002-07-02 |
| 6409933 | Plasma reactor having a symmetric parallel conductor coil antenna | John Holland, Valentin N. Todorow | 2002-06-25 |
| 6364958 | Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges | Canfeng Lai, Michael S. Cox, Lily Pang | 2002-04-02 |
| 6361645 | Method and device for compensating wafer bias in a plasma processing chamber | Alan M. Schoepp, Robert Knop, Christopher H. Olson, Tuan Ngo | 2002-03-26 |