| 6754062 |
Hybrid ceramic electrostatic clamp |
John R. Miller, Mahmood Naim, Robert E. Tompkins |
2004-06-22 |
| RE37580 |
Guard ring electrostatic chuck |
Michael Barnes, John H. Keller, Robert E. Tompkins, Robert P. Westerfield, Jr. |
2002-03-12 |
| RE37541 |
Electrostatic chuck with reference electrode |
Michael Barnes, John H. Keller, Robert E. Tompkins, Robert P. Westerfield, Jr. |
2002-02-05 |
| 6268994 |
Electrostatic chuck and method of manufacture |
Robert E. Tompkins, John R. Miller |
2001-07-31 |
| 6214482 |
Dielectric-layer for magneto-optic storage media structures |
Christopher V. Jahnes, Fletcher Jones, Michael A. Russak |
2001-04-10 |
| 5905626 |
Electrostatic chuck with ceramic pole protection |
Robert E. Tompkins |
1999-05-18 |
| 5901030 |
Electrostatic chuck employing thermoelectric cooling |
Robert E. Tompkins |
1999-05-04 |
| 5612851 |
Guard ring electrostatic chuck |
Michael Barnes, John H. Keller, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1997-03-18 |
| 5561585 |
Electrostatic chuck with reference electrode |
Michael Barnes, John H. Keller, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1996-10-01 |
| 5535507 |
Method of making electrostatic chuck with oxide insulator |
Michael Barnes, John H. Keller, Raymond R. Ruckel, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1996-07-16 |
| 5467249 |
Electrostatic chuck with reference electrode |
Michael Barnes, John H. Keller, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1995-11-14 |
| 5463525 |
Guard ring electrostatic chuck |
Michael Barnes, John H. Keller, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1995-10-31 |
| 5302266 |
Method and apparatus for filing high aspect patterns with metal |
Henry Grabarz, Alfred Grill, William M. Holber, James T. Yeh |
1994-04-12 |
| 5263776 |
Multi-wavelength optical thermometry |
David W. Abraham, William M. Holber, Hemantha K. Wickramasinghe |
1993-11-23 |
| 5208512 |
Scanned electron cyclotron resonance plasma source |
John C. Forster, William M. Holber |
1993-05-04 |
| 5191506 |
Ceramic electrostatic chuck |
Raymond R. Ruckel, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1993-03-02 |
| 5155652 |
Temperature cycling ceramic electrostatic chuck |
Raymond R. Ruckel, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1992-10-13 |
| 5099571 |
Method for fabricating a split-ring electrostatic chuck |
Raymond R. Ruckel, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1992-03-31 |
| 5055964 |
Electrostatic chuck having tapered electrodes |
Raymond R. Ruckel, Robert E. Tompkins, Robert P. Westerfield, Jr. |
1991-10-08 |
| 4818359 |
Low contamination RF sputter deposition apparatus |
Fletcher Jones |
1989-04-04 |
| 4637853 |
Hollow cathode enhanced plasma for high rate reactive ion etching and deposition |
Bruce Bumble, Jerome J. Cuomo, Steven M. Rossnagel |
1987-01-20 |
| 4447824 |
Planar multi-level metal process with built-in etch stop |
John L. Mauer, IV, Laura Rothman, Geraldine C. Schwartz, Charles L. Standley |
1984-05-08 |
| 4367119 |
Planar multi-level metal process with built-in etch stop |
John L. Mauer, IV, Laura Rothman, Geraldine C. Schwartz, Charles L. Standley |
1983-01-04 |
| 4362611 |
Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield |
Steve I. Petvai, Cornel Rosu |
1982-12-07 |
| 4333794 |
Omission of thick Si.sub.3 N.sub.4 layers in ISA schemes |
Klaus D. Beyer |
1982-06-08 |
