Issued Patents All Time
Showing 26–50 of 222 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11562890 | Corrosion resistant ground shield of processing chamber | Xiao-Ming He, Jennifer Y. Sun, Xiaowei Wu, Laksheswar Kalita, Soonam Park | 2023-01-24 |
| 11557464 | Semiconductor chamber coatings and processes | Laksheswar Kalita, Son T. Nguyen, Kenneth D. Schatz | 2023-01-17 |
| 11533783 | Multi-zone heater model-based control in semiconductor manufacturing | Mauro Cimino, Don Channa Kaluarachchi, Son M. Phi, Ramyashree Vishnuprasad | 2022-12-20 |
| 11476093 | Plasma etching systems and methods with secondary plasma injection | Toan Q. Tran, Soonam Park, Zilu Weng | 2022-10-18 |
| 11410860 | Process chamber for etching low k and other dielectric films | Srinivas D. Nemani, Ellie Yieh, Sergey G. Belostotskiy | 2022-08-09 |
| 11373845 | Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes | Tae Seung Cho, Saravana Kumar Natarajan, Kenneth D. Schatz, Samartha Subramanya | 2022-06-28 |
| 11361939 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dongqing Yang, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2022-06-14 |
| 11361941 | Methods and apparatus for processing a substrate | Junghoon Kim, Tae Seung Cho, Toan Q. Tran | 2022-06-14 |
| 11355317 | Methods and apparatus for dynamical control of radial uniformity in microwave chambers | Satoru Kobayashi, Lance A. Scudder, David Alexander BRITZ, Soonam Park, Hideo Sugai | 2022-06-07 |
| 11348783 | Methods and apparatus for dynamical control of radial uniformity with two-story microwave cavities | Satoru Kobayashi, Hideo Sugai, Denis Ivanov, Lance A. Scudder | 2022-05-31 |
| 11322337 | Plasma processing system workpiece carrier with thermally isolated heater plate blocks | Son T. Nguyen, Anh N. Nguyen, David Palagashvili | 2022-05-03 |
| 11302520 | Chamber apparatus for chemical etching of dielectric materials | Tien Fak Tan, Kirby H. Floyd, Son T. Nguyen, David Palagashvili, Alexander Tam +1 more | 2022-04-12 |
| 11302519 | Method of patterning a low-k dielectric film | Srinivas D. Nemani, Jeremiah T. Pender, Qingjun Zhou, Sergey G. Belostotskiy | 2022-04-12 |
| 11279661 | Heat treated ceramic substrate having ceramic coating | Jennifer Y. Sun, Ren-Guan Duan, Biraja P. Kanungo | 2022-03-22 |
| 11276590 | Multi-zone semiconductor substrate supports | Mehmet Tugrul Samir, Dongqing Yang, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2022-03-15 |
| 11276559 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dongqing Yang, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2022-03-15 |
| 11264213 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Soonam Park, Jang-Gyoo Yang +4 more | 2022-03-01 |
| 11257693 | Methods and systems to improve pedestal temperature control | Son T. Nguyen, Chungman Kim, Kirby H. Floyd | 2022-02-22 |
| 11239061 | Methods and systems to enhance process uniformity | Saravjeet Singh, Alan Tso, Jingchun Zhang, Zihui Li, Hanshen Zhang | 2022-02-01 |
| 11217462 | Bolted wafer chuck thermal management systems and methods for wafer processing systems | David Benjaminson, Ananda Seelavanth Math, Saravanakumar Natarajan, Shubham Chourey | 2022-01-04 |
| 11195699 | Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Soonam Park | 2021-12-07 |
| 11164724 | Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing | Sang Won Kang, Nicholas Celeste, Peter M. Hillman, Douglas B. Hayden, Dongqing Yang | 2021-11-02 |
| 11158527 | Thermal management systems and methods for wafer processing systems | David Benjaminson | 2021-10-26 |
| 11130142 | Showerhead having a detachable gas distribution plate | Vladimir Knyazik, Hamid Noorbakhsh, Jason C. Della Rosa, Zheng John Ye, Jennifer Y. Sun +1 more | 2021-09-28 |
| 11101136 | Process window widening using coated parts in plasma etch processes | Dongqing Yang, Tien Fak Tan, Peter M. Hillman, Lala Zhu, Nitin K. Ingle +2 more | 2021-08-24 |