Issued Patents All Time
Showing 25 most recent of 98 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12205791 | Rating substrate support assemblies based on impedance circuit electron flow using machine learning | Arvind Raman, Harikrishnan Rajagopal | 2025-01-21 |
| 12142458 | Symmetric plasma source to generate pie-shaped treatment | Anantha K. Subramani, Farzad Houshmand, Philip Allan Kraus, Abhishek Chowdhury, Kallol Bera | 2024-11-12 |
| 12100576 | Metal oxide preclean chamber with improved selectivity and flow conductance | Andrew Nguyen, Xue Yang Chang, Yu Lei, Xianmin Tang, Yogananda Sarode Vishwanath +2 more | 2024-09-24 |
| 12080519 | Smart dynamic load simulator for RF power delivery control system | Jie Yu, Yue Guo, Kartik Ramaswamy, Tao Zhang, Shahid Rauf +2 more | 2024-09-03 |
| 12027354 | Cleaning of SIN with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more | 2024-07-02 |
| 12014906 | High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber | William Johanson, Keith A. Miller, Cheng-Hsiung Tsai, Mukund Sundararajan | 2024-06-18 |
| 11915918 | Cleaning of sin with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more | 2024-02-27 |
| 11915917 | Methods and apparatus for reducing sputtering of a grounded shield in a process chamber | Alan A. Ritchie, Muhammad M. Rasheed | 2024-02-27 |
| 11898236 | Methods and apparatus for processing a substrate | Zhiyong Wang, Halbert Chong, Irena H. Wysok, Tiefeng Shi, Gang Fu +9 more | 2024-02-13 |
| 11887818 | Methods and systems to modulate film stress | Tsutomu Tanaka, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu +2 more | 2024-01-30 |
| 11823871 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar +3 more | 2023-11-21 |
| 11315763 | Shaped electrodes for improved plasma exposure from vertical plasma source | Kallol Bera, Dmitry A. Dzilno, Anantha K. Subramani, Tsutomu Tanaka | 2022-04-26 |
| 11315769 | Plasma source for rotating susceptor | Kallol Bera, Anantha K. Subramani, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen | 2022-04-26 |
| 11170982 | Methods and apparatus for producing low angle depositions | Anantha K. Subramani, Praburam Gopal Raja, Steven V. Sansoni, Philip Allan Kraus, Yang Guo +5 more | 2021-11-09 |
| 11158489 | Methods and systems to modulate film stress | Tsutomu Tanaka, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu +2 more | 2021-10-26 |
| 11133155 | Apparatus for depositing metal films with plasma treatment | Daping Yao, Hyman Lam, Jiang Lu, Can Xu, Dien-Yeh Wu +2 more | 2021-09-28 |
| 11081318 | Geometrically selective deposition of dielectric films utilizing low frequency bias | Kenichi Ohno, Keiichi Tanaka, Li-Qun Xia, Tsutomu Tanaka, Dmitry A. Dzilno +4 more | 2021-08-03 |
| 10903056 | Plasma source for rotating susceptor | Kallol Bera, Anantha K. Subramani, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen | 2021-01-26 |
| 10879042 | Symmetric plasma source to generate pie shaped treatment | Anantha K. Subramani, Farzad Houshmand, Philip Allan Kraus, Abhishek Chowdhury, Kallol Bera | 2020-12-29 |
| 10763085 | Shaped electrodes for improved plasma exposure from vertical plasma source | Kallol Bera, Dmitry A. Dzilno, Anantha K. Subramani, Tsutomu Tanaka | 2020-09-01 |
| 10692706 | Methods and apparatus for reducing sputtering of a grounded shield in a process chamber | Alan A. Ritchie, Muhammad M. Rasheed | 2020-06-23 |
| 10593521 | Substrate support for plasma etch operations | Larry Frazier, Cheng-Hsiung Tsai, Mei Po (Mabel) Yeung, Michael S. Jackson | 2020-03-17 |
| 10453657 | Apparatus for depositing metal films with plasma treatment | Daping Yao, Hyman Lam, Jiang Lu, Can Xu, Dien-Yeh Wu +2 more | 2019-10-22 |
| 10121655 | Lateral plasma/radical source | Anantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, Nattaworn Nuntaworanuch, Kallol Bera +2 more | 2018-11-06 |
| 10099245 | Process kit for deposition and etching | Zhenbin Ge, Alan A. Ritchie | 2018-10-16 |