| 11650047 |
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela +1 more |
2023-05-16 |
| 11644428 |
Diffraction based overlay metrology tool and method of diffraction based overlay metrology |
— |
2023-05-09 |
| 11640116 |
Metrology method, computer product and system |
Kaustuve Bhattacharyya |
2023-05-02 |
| 11619595 |
Diffraction based overlay metrology tool and method of diffraction based overlay metrology |
— |
2023-04-04 |
| 11549806 |
Metrology apparatus |
Marinus Johannes Maria Van Dam, Nitesh Pandey |
2023-01-10 |
| 11525786 |
Method and apparatus for angular-resolved spectroscopic lithography characterization |
Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more |
2022-12-13 |
| 11428521 |
Metrology method, target and substrate |
Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more |
2022-08-30 |
| 11429029 |
Method and apparatus for illumination adjustment |
Maurits Van Der Schaar, Patrick Warnaar, Youping Zhang, Feng Xiao, Martin Ebert |
2022-08-30 |
| 11415900 |
Metrology system and method for determining a characteristic of one or more structures on a substrate |
Patricius Aloysius Jacobus Tinnemans, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene +1 more |
2022-08-16 |
| 11385553 |
Metrology method, patterning device, apparatus and computer program |
Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar +6 more |
2022-07-12 |
| 11333985 |
Position sensor |
Sebastianus Adrianus GOORDEN, Simon Reinald HUISMAN, Duygu Akbulut, Alessandro Polo, Johannes Antonius Gerardus Akkermans |
2022-05-17 |
| 11327410 |
Metrology apparatus and a method of determining a characteristic of interest |
Ronald Joseph Antonius Van Den Oetelaar |
2022-05-10 |
| 11320745 |
Measuring a process parameter for a manufacturing process involving lithography |
Maurits Van Der Schaar, Omer Abubaker Omer Adam, Te-Chih Huang, Youping Zhang |
2022-05-03 |
| 11307024 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
Henricus Petrus Maria Pellemans |
2022-04-19 |
| 11262661 |
Metrology apparatus |
Nitesh Pandey, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer +4 more |
2022-03-01 |
| 11204239 |
Metrology method, target and substrate |
Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more |
2021-12-21 |
| 11143972 |
Method and apparatus to determine a patterning process parameter |
Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin +2 more |
2021-10-12 |
| 11119415 |
Method of determining a characteristic of a structure, and metrology apparatus |
Johannes F. de Boer, Vasco Tomas Tenner, Christos MESSINIS |
2021-09-14 |
| 11106142 |
Metrology recipe selection |
Kaustuve Bhattacharyya, Martin Jacobus Johan Jak |
2021-08-31 |
| 11099489 |
Method of measuring a parameter of a lithographic process, metrology apparatus |
Hugo Augustinus Joseph Cramer, Hilko Dirk Bos, Erik Johan Koop, Armand Eugene Albert Koolen, Han-Kwang Nienhuys +2 more |
2021-08-24 |
| 11092902 |
Method and apparatus for detecting substrate surface variations |
Johannes F. M. D'Achard Van Enschut, Tamara Druzhinina, Nitish Kumar, Sarathi ROY, Yang-Shan Huang +3 more |
2021-08-17 |
| 11080459 |
Computational wafer inspection |
Christophe David Fouquet, Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen +1 more |
2021-08-03 |
| 11022902 |
Sensor, lithographic apparatus, and device manufacturing method |
Patricius Aloysius Jacobus Tinnemans, Haico Victor Kok, William Peter Van Drent, Sebastianus Adrianus GOORDEN |
2021-06-01 |
| 11016397 |
Source separation from metrology data |
Scott Anderson Middlebrooks, Omer Abubaker Omer Adam, Adrianus Cornelis Matheus Koopman, Henricus Johannes Lambertus Megens |
2021-05-25 |
| 11009343 |
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela +1 more |
2021-05-18 |
