Issued Patents All Time
Showing 76–100 of 251 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10527957 | Method and apparatus for processing a substrate in a lithographic apparatus | Cayetano Sanchez-Fabres Cobaleda, Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Marcel Hendrikus Maria Beems, Piotr Michał Stolarz | 2020-01-07 |
| 10527953 | Metrology recipe selection | Kaustuve Bhattacharyya, Martin Jacobus Johan Jak | 2020-01-07 |
| 10527949 | Metrology method, computer product and system | Kaustuve Bhattacharyya | 2020-01-07 |
| 10520451 | Diffraction based overlay metrology tool and method of diffraction based overlay metrology | — | 2019-12-31 |
| 10508906 | Method of measuring a parameter and apparatus | Simon Reinald HUISMAN | 2019-12-17 |
| 10481499 | Determination of stack difference and correction using stack difference | Kaustuve Bhattacharyya | 2019-11-19 |
| 10474039 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Paul Christiaan Hinnen, Simon Gijsbert Josephus Mathijssen, Maikel Robert GOOSEN, Maurits Van Der Schaar | 2019-11-12 |
| 10474045 | Lithographic apparatus and device manufacturing method | Franciscus Godefridus Casper Bijnen, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma, Irina Lyulina +6 more | 2019-11-12 |
| 10451978 | Metrology parameter determination and metrology recipe selection | Kaustuve Bhattacharyya, Simon Gijsbert Josephus Mathijssen, Marc Johannes Noot, Mohammadreza Hajiahmadi, Farzad Farhadzadeh | 2019-10-22 |
| 10408754 | Method of measuring a target, substrate, metrology apparatus, and lithographic apparatus | Euclid E. Moon | 2019-09-10 |
| 10394137 | Inspection method, lithographic apparatus, mask and substrate | Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Kaustuve Bhattacharyya, Paul Christiaan Hinnen +1 more | 2019-08-27 |
| 10394140 | Lithographic apparatus | Hendrikus Herman Marie Cox, Paul Corné Henri DE WIT, Adrianus Hendrik Koevoets, Jim Vincent Overkamp, Frits Van Der Meulen +1 more | 2019-08-27 |
| 10394143 | Topography measurement system | Nitesh Pandey, Heine Melle Mulder, Willem Richard Pongers, Paulus Antonius Andreas Teunissen | 2019-08-27 |
| 10386176 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2019-08-20 |
| 10386735 | Lithographic apparatus alignment sensor and method | Simon Gijsbert Josephus Mathijssen, Nitesh Pandey, Patricius Aloysius Jacobus Tinnemans, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema | 2019-08-20 |
| 10379448 | Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus | Simon Gijsbert Josephus Mathijssen, Sander Bas Roobol, Nan Lin, Willem Marie Julia Marcel Coene | 2019-08-13 |
| 10379445 | Metrology method, target and substrate | Martin Jacobus Johan Jak, Martin Ebert | 2019-08-13 |
| 10365565 | Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein | Nitesh Pandey, Marinus Johannes Maria Van Dam | 2019-07-30 |
| 10345709 | Determination of stack difference and correction using stack difference | Kaustuve Bhattacharyya | 2019-07-09 |
| 10338484 | Recipe selection based on inter-recipe consistency | Timothy Dugan Davis, Peter David Engblom, Kaustuve Bhattacharyya | 2019-07-02 |
| 10317808 | Position sensing arrangement and lithographic apparatus including such an arrangement, position sensing method and device manufacturing method | Simon Reinald HUISMAN, Alessandro Polo, Duygu Akbulut, Sebastianus Adrianus GOORDEN | 2019-06-11 |
| 10274370 | Inspection apparatus and method | — | 2019-04-30 |
| 10268124 | Asymmetry monitoring of a structure | — | 2019-04-23 |
| 10261427 | Metrology method and apparatus, computer program and lithographic system | Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Alexander Straaijer, Ching-Yi Hung +1 more | 2019-04-16 |
| 10254658 | Metrology method, target and substrate | Daan Maurits Slotboom, Martin Ebert | 2019-04-09 |