Issued Patents All Time
Showing 51–75 of 108 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8143166 | Polishing method with inert gas injection | Feng Zhao, Wu Ping Liu, John Sudijono, Lawrence A. Clevenger | 2012-03-27 |
| 8117568 | Apparatus, method and computer program product for fast simulation of manufacturing effects during integrated circuit design | Hua Xiang, Mohammed Fazil Fayaz, Stephen E. Greco, Patricia A. O'Neil, Ruchir Puri | 2012-02-14 |
| 7993498 | Apparatus and method of electrolytic removal of metals from a wafer surface | Hariklia Deligianni, Catherine Ivers, Xiaoyan Shao | 2011-08-09 |
| 7473159 | Detection of diamond contamination in polishing pad and reconditioning system therefor | John A. Fitzsimmons | 2009-01-06 |
| 7470985 | Solder connector structure and method | Mukta G. Farooq, Ian D. Melville, Kevin S. Petrarca, Richard P. Volant | 2008-12-30 |
| 7354333 | Detection of diamond contamination in polishing pad | John A. Fitzsimmons | 2008-04-08 |
| 7214623 | Planarization system and method using a carbonate containing fluid | Donald J. Delehanty, James Hannah, Daniel Heenan, Fen F. Jamin | 2007-05-08 |
| 7091103 | TEOS assisted oxide CMP process | Jochen Beintner, Michael Wise, Andreas Knorr | 2006-08-15 |
| 7040966 | Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers | Joseph F. Salfelder, Wayne R. Swart, Gopalakrishna B. Prabhu, Srinivas R. Mirmira, Fen F. Jamin +3 more | 2006-05-09 |
| 6869860 | Filling high aspect ratio isolation structures with polysilazane based material | Michael P. Belyansky, Rama Divakaruni, Rajarao Jammy, Kenneth Settlemeyer, Padraic Shafer | 2005-03-22 |
| 6794242 | Extendible process for improved top oxide layer for DRAM array and the gate interconnects while providing self-aligned gate contacts | Thomas W. Dyer, Andreas Knorr, Scott D. Halle, Rajeev Malik, Norbert Arnod | 2004-09-21 |
| 6776885 | Integrated plating and planarization apparatus having a variable-diameter counterelectrode | Hariklia Deligianni, John M. Cotte, Panayotis Andricacos | 2004-08-17 |
| 6773570 | Integrated plating and planarization process and apparatus therefor | Hariklia Deligianni, John M. Cotte, Henry Grabarz, Bomy Chen | 2004-08-10 |
| 6656817 | Method of filling isolation trenches in a substrate | Ramachandra Divakaruni, Byeong Y. Kim | 2003-12-02 |
| 6596580 | Recess Pt structure for high k stacked capacitor in DRAM and FRAM, and the method to form this structure | Jingyu Lian, Greg Costrini, Michael Wise | 2003-07-22 |
| 6569769 | Slurry-less chemical-mechanical polishing | Alexander William Simpson, Ravikumar Ramachandran | 2003-05-27 |
| 6485355 | Method to increase removal rate of oxide using fixed-abrasive | Alexander William Simpson | 2002-11-26 |
| 6448169 | Apparatus and method for use in manufacturing semiconductor devices | William Brearley, Paul F. Findeis, Kimberley A. Kelly, Bouwe W. Leenstra, Arthur G. Merryman +4 more | 2002-09-10 |
| 6444919 | Thin film wiring scheme utilizing inter-chip site surface wiring | Mukta S. Farooq, Michael F. McAllister, Eric D. Perfecto, Chandrika Prasad, Keshav Prasad +3 more | 2002-09-03 |
| 6429149 | Low temperature LPCVD PSG/BPSG process | Ashima B. Chakravarti, Richard A. Conti, Byeongju Park | 2002-08-06 |
| 6403412 | Method for in-situ formation of bottle shaped trench by gas phase etching | Byeongju Park | 2002-06-11 |
| 6368969 | Chemical-mechanical polishing methods | Fen F. Jamin | 2002-04-09 |
| 6365328 | Semiconductor structure and manufacturing method | Hua Shen, David E. Kotecki, Satish D. Athavale, Jenny Lian, Fen F. Jamin +2 more | 2002-04-02 |
| 6358850 | Slurry-less chemical-mechanical polishing of oxide materials | Sumit Pandey, Ronald J. Schutz, Ravikumar Ramachandran | 2002-03-19 |
| 6359300 | High aspect ratio deep trench capacitor having void-free fill | Byeongju Park | 2002-03-19 |