Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8518820 | Methods for forming contacts in semiconductor devices | Roberto Schiwon, Klaus Herold, Sajan Marokkey, Martin Ostermayr | 2013-08-27 |
| 7674703 | Gridded contacts in semiconductor devices | Roberto Schiwon, Klaus Herold, Sajan Marokkey, Martin Ostermayr | 2010-03-09 |
| 7316980 | Method for forming ferrocapacitors and FeRAM devices | Haoren Zhuang, Ulrich Egger, Rainer Bruchhaus, Karl Hornik, Stefan Gernhardt | 2008-01-08 |
| 7071506 | Device for inhibiting hydrogen damage in ferroelectric capacitor devices | Bum Ki Moon, Karl Hornik, Haoren Zhuang, Ulrich Egger, Andreas Hilliger | 2006-07-04 |
| 7041551 | Device and a method for forming a capacitor device | Haoren Zhuang, Nicolas Nagel, Rainer Bruchhaus | 2006-05-09 |
| 7002196 | Ferroelectric capacitor devices and FeRAM devices | Andreas Hilliger | 2006-02-21 |
| 7001781 | Method for producing a ferroelectric capacitor that includes etching with hardmasks | Ulrich Egger, Haoren Zhuang | 2006-02-21 |
| 6946735 | Side-wall barrier structure and method of fabrication | Stefan Gernhardt, Andreas Hilliger, Rainer Bruchhaus, Uwe Wellhausen, Nicolas Nagel | 2005-09-20 |
| 6734057 | Method of patterning capacitors and capacitors made thereby | Haoren Zhuang, Ulrich Egger, Karl Hornik | 2004-05-11 |
| 6420267 | Method for forming an integrated barrier/plug for a stacked capacitor | Chenting Lin, Ronald J. Schutz, Andreas Knorr, Keith Kwong Hon Wong, Hua Shen | 2002-07-16 |
| 6420272 | Method for removal of hard mask used to define noble metal electrode | Hua Shen, David E. Kotecki, Satish D. Athavale, Gerhard Kunkel, Nimal Chaudhary | 2002-07-16 |
| 6365328 | Semiconductor structure and manufacturing method | Hua Shen, David E. Kotecki, Satish D. Athavale, Laertis Economikos, Fen F. Jamin +2 more | 2002-04-02 |
| 6339007 | Capacitor stack structure and method of fabricating description | Yun-Yu Wang, Rajarao Jammy, Lee J. Kimball, David E. Kotecki, Chenting Lin +4 more | 2002-01-15 |
| 6261967 | Easy to remove hard mask layer for semiconductor device fabrication | Satish D. Athavale, Hua Shen, David E. Kotecki | 2001-07-17 |
| 6207584 | High dielectric constant material deposition to achieve high capacitance | Hua Shen, David E. Kotecki, Robert Benjamin Laibowitz, Katherine L. Saenger, Satish D. Athavale +3 more | 2001-03-27 |
| 6083788 | Stacked capacitor memory cell and method of manufacture | Gerhard Kunkel | 2000-07-04 |