Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7214623 | Planarization system and method using a carbonate containing fluid | James Hannah, Daniel Heenan, Fen F. Jamin, Laertis Economikos | 2007-05-08 |
| 7040966 | Carbonation of pH controlled KOH solution for improved polishing of oxide films on semiconductor wafers | Joseph F. Salfelder, Wayne R. Swart, Gopalakrishna B. Prabhu, Srinivas R. Mirmira, Laertis Economikos +3 more | 2006-05-09 |
| 6837777 | Wafer edge cleaning utilizing polish pad material | Uldis A. Ziemins, Raymond M. Khoury, Jose M. Ocasio | 2005-01-04 |
| 6622334 | Wafer edge cleaning utilizing polish pad material | Uldis A. Ziemins, Raymond M. Khoury, Jose M. Ocasio | 2003-09-23 |
| 6425956 | Process for removing chemical mechanical polishing residual slurry | John M. Cotte, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft +1 more | 2002-07-30 |
| 5780363 | Etching composition and use thereof | Rangarajan Jagannathan, Kenneth McCullough, Donna Diane Miura, George F. Ouimet, David L. Rath +2 more | 1998-07-14 |