Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6942549 | Two-sided chemical mechanical polishing pad for semiconductor processing | — | 2005-09-13 |
| 6837777 | Wafer edge cleaning utilizing polish pad material | Uldis A. Ziemins, Donald J. Delehanty, Jose M. Ocasio | 2005-01-04 |
| 6622334 | Wafer edge cleaning utilizing polish pad material | Uldis A. Ziemins, Donald J. Delehanty, Jose M. Ocasio | 2003-09-23 |
| 6620029 | Apparatus and method for front side chemical mechanical planarization (CMP) of semiconductor workpieces | Jose M. Ocasio, Uldis A. Ziemins | 2003-09-16 |
| 6467120 | Wafer cleaning brush profile modification | Uldis A. Ziemins, Jose M. Ocasio, David A. Goodwin | 2002-10-22 |
| 6343974 | Real-time method for profiling and conditioning chemical-mechanical polishing pads | Daniel L. Franca, Jose M. Ocasio, Uldis A. Ziemins | 2002-02-05 |
| 6334230 | Wafer cleaning apparatus | Marc Mattaroccia, Jose M. Ocasio | 2002-01-01 |
| 6227948 | Polishing pad reconditioning via polishing pad material as conditioner | Robert M. Merkling, Jr., Jose M. Ocasio, Uldis A. Ziemins | 2001-05-08 |
| 6217422 | Light energy cleaning of polishing pads | Daniel L. Franca, Jose M. Ocasio, Uldis A. Ziemins | 2001-04-17 |