Issued Patents All Time
Showing 101–125 of 127 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7551263 | Device for adjusting the illumination dose on a photosensitive layer | Markus Deguenther | 2009-06-23 |
| 7508489 | Method of manufacturing a miniaturized device | Markus Schwab, Aksel Goehnermeier, Tammo Uitterdijk | 2009-03-24 |
| 7463422 | Projection exposure apparatus | Vladimir Kamenow, Daniel Kraehmer, Michael Totzeck, Aurelian Dodoc, David Shafer +4 more | 2008-12-09 |
| 7460206 | Projection objective for immersion lithography | Patrick Scheible, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek +5 more | 2008-12-02 |
| 7456933 | Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus | Ulrich Wegmann, Vladimir Kamenov, Thomas Muelders, Markus Mengel | 2008-11-25 |
| 7423765 | Optical system of a microlithographic projection exposure apparatus | Joerg Tschischgale | 2008-09-09 |
| 7408616 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann +4 more | 2008-08-05 |
| 7405808 | Optical system, in particular illumination system, of a microlithographic projection exposure apparatus | Michael Totzeck, Damian Fiolka, Wilhelm Ulrich, Gerhard Fuerter | 2008-07-29 |
| 7382536 | Objective with fluoride crystal lenses | Daniel Krähmer, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2008-06-03 |
| 7355791 | Optical system and photolithography tool comprising same | Vladimir Kamenov | 2008-04-08 |
| 7321465 | Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses | Michael Totzeck, Vladimir Kamenov | 2008-01-22 |
| 7292388 | Lens made of a crystalline material | Birgit Enkisch, Hartmut Enkisch | 2007-11-06 |
| 7286284 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Michael Totzeck, Heiko Feldmann, Karl-Heinz Schuster, Joern Greif-Wuestenbecker, Thomas Scheruebl +3 more | 2007-10-23 |
| 7256932 | Optical system for ultraviolet light | Alexander Epple, Wolfgang Singer | 2007-08-14 |
| 7239450 | Method of determining lens materials for a projection exposure apparatus | Vladimir Kamenov, Daniel Kraehmer, Michael Totzeck, Aurelian Dodoc | 2007-07-03 |
| 7180667 | Objective with fluoride crystal lenses | Daniel Krähmer, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2007-02-20 |
| 7145720 | Objective with fluoride crystal lenses | Daniel Krähmer, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2006-12-05 |
| 7126765 | Objective with fluoride crystal lenses | Daniel Krähmer, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2006-10-24 |
| 7079331 | Device for holding a beam splitter element | Ulrich Weber, Alexander Kohl, Hubert Holderer, Armin Schoeppach, Erwin Gaber +5 more | 2006-07-18 |
| 7068436 | Projection lens for a microlithographic projection exposure apparatus | Hans-Jurgen Mann | 2006-06-27 |
| 7031069 | Microlithographic illumination method and a projection lens for carrying out the method | Manfred Maul, Rudolf Von Buenau | 2006-04-18 |
| 7027237 | Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method | Birgit Mecking, Alexander Kohl | 2006-04-11 |
| 6963449 | Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method | Birgit Mecking, Alexander Kohl | 2005-11-08 |
| 6842294 | Catadioptric objective | Hubert Holderer, Ulrich Weber, Alexander Kohl, Christoph Zaczek, Jens Ullmann +3 more | 2005-01-11 |
| 6806942 | Projection exposure system | Karl-Heinz Schuster, Wilhelm Ulrich, Daniel Kraehmer, Wolfgang Singer, Alexander Epple +2 more | 2004-10-19 |