Issued Patents All Time
Showing 51–75 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9575414 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul +4 more | 2017-02-21 |
| 9563129 | Monitor system for determining orientations of mirror elements and EUV lithography system | Johannes Wangler, Johannes Eisenmenger, Michael Patra | 2017-02-07 |
| 9535210 | Optical hollow waveguide assembly | Stefan Schmidt, Vladimir Davydenko | 2017-01-03 |
| 9523923 | Illumination system of a microlithographic projection exposure apparatus | — | 2016-12-20 |
| 9500954 | Illumination system of a microlithographic projection exposure apparatus | Vladimir Davydenko, Thomas Korb, Frank Schlesener, Stefanie Hilt, Wolfgang Hoegele | 2016-11-22 |
| 9494483 | Measuring system for measuring an imaging quality of an EUV lens | Ralf Frese, Michael Samaniego, Helmut Haidner, Rainer Hoch, Martin Schriever | 2016-11-15 |
| 9477157 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Stig Bieling, Frank Schlesener, Markus Schwab | 2016-10-25 |
| 9454085 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Gerhard-Wilhelm Ziegler | 2016-09-27 |
| 9448490 | EUV lithography system | Udo Dinger, Lars Wischmeier, Markus Hauf, Stephan Kellner, Igor Gurevich | 2016-09-20 |
| 9423686 | Mask for microlithography and scanning projection exposure method utilizing the mask | Michael Patra | 2016-08-23 |
| 9377415 | Measuring device for measuring an illumination property | Michael Arnz | 2016-06-28 |
| 9341953 | Microlithographic illumination system | Michael Layh, Michael Gerhard, Bruno Thome, Wolfgang Singer | 2016-05-17 |
| 9316772 | Producing polarization-modulating optical element for microlithography system | Damian Fiolka | 2016-04-19 |
| 9310690 | Illumination system of a microlithographic projection exposure apparatus | Vladimir Davydenko, Thomas Korb, Frank Schlesener, Stefanie Hilt, Wolfgang Hoegele | 2016-04-12 |
| 9310694 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Michael Layh | 2016-04-12 |
| 9280060 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2016-03-08 |
| 9280055 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra | 2016-03-08 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9217930 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul +4 more | 2015-12-22 |
| 9176390 | Method for adjusting an illumination system of a projection exposure apparatus for projection lithography | Michael Layh | 2015-11-03 |
| 9116439 | Illumination system and lithographic apparatus | Heine Melle Mulder, Steven George Hansen, Johannes Catharinus Hubertus Mulkens | 2015-08-25 |
| 9091945 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Gerhard-Wilhelm Ziegler | 2015-07-28 |
| 9086637 | Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system | Bernhard Kneer, Toralf Gruner | 2015-07-21 |
| 9046786 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Stig Bieling, Frank Schlesener, Markus Schwab | 2015-06-02 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-28 |