Issued Patents All Time
Showing 76–100 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-21 |
| 9007563 | Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus | Michael Layh | 2015-04-14 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-07 |
| 8891057 | Microlithographic projection exposure apparatus | Michael Layh, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2014-11-18 |
| 8873023 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2014-10-28 |
| 8861084 | Polarization-modulating optical element | Damian Fiolka | 2014-10-14 |
| 8854604 | Microlithographic projection exposure apparatus | Michael Patra, Andras G. Major | 2014-10-07 |
| 8773639 | Illumination system of a microlithographic projection exposure apparatus | Andras G. Major, Anne Christine Andresen | 2014-07-08 |
| 8755031 | Illumination system of a microlithographic projection exposure apparatus | — | 2014-06-17 |
| 8730455 | Illumination system for a microlithographic projection exposure apparatus | Damian Fiolka, Manfred Maul, Axel Scholz, Johannes Wangler, Vladimir Davydenko | 2014-05-20 |
| 8724086 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2014-05-13 |
| 8711479 | Illumination apparatus for microlithography projection system including polarization-modulating optical element | Damian Fiolka | 2014-04-29 |
| 8705000 | Illumination optics and projection exposure apparatus | Artur Hoegele | 2014-04-22 |
| 8705005 | Microlithographic illumination system | Michael Layh, Michael Gerhard, Bruno Thome, Wolfgang Singer | 2014-04-22 |
| 8699121 | Illumination system of a microlithographic projection exposure apparatus | — | 2014-04-15 |
| 8537335 | Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system | Markus Schwab, Michael Layh, Artur Hoegele | 2013-09-17 |
| 8482717 | Polarization-modulating optical element | Damian Fiolka | 2013-07-09 |
| 8467031 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Michael Layh | 2013-06-18 |
| 8416390 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Paul Graeupner, Juergen Fischer | 2013-04-09 |
| 8395756 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul +4 more | 2013-03-12 |
| 8351023 | Illumination device of a microlithographic projection exposure apparatus, and microlithographic projection exposure method | — | 2013-01-08 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2012-12-25 |
| 8320043 | Illumination apparatus for microlithographyprojection system including polarization-modulating optical element | Damian Fiolka | 2012-11-27 |
| 8294877 | Illumination optical unit for projection lithography | Johannes Wangler, Stig Bieling | 2012-10-23 |
| 8289623 | Polarization-modulating optical element | Damian Fiolka | 2012-10-16 |