Issued Patents All Time
Showing 51–75 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8992689 | Method for removing halogen-containing residues from substrate | Adauto Diaz, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee, James P. Cruse +4 more | 2015-03-31 |
| 8932959 | Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material | Srinivas D. Nemani, Mang-Mang Ling, Jeremiah T. Pender, Kartik Ramaswamy, Sergey G. Belostotskiy +1 more | 2015-01-13 |
| 8900405 | Plasma immersion ion implantation reactor with extended cathode process ring | Peter I. Porshnev, Majeed A. Foad, Kartik Ramaswamy, Biagio Gallo, Hiroji Hanawa +2 more | 2014-12-02 |
| 8845816 | Method extending the service interval of a gas distribution plate | Adauto Diaz, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee, James P. Cruse +4 more | 2014-09-30 |
| 8721798 | Methods for processing substrates in process systems having shared resources | James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more | 2014-05-13 |
| 8707754 | Methods and apparatus for calibrating flow controllers in substrate processing systems | James P. Cruse, John W. Lane, Mariusch Gregor, Duc Dang Buckius, Berrin Daran +2 more | 2014-04-29 |
| 8652297 | Symmetric VHF plasma power coupler with active uniformity steering | Kenneth S. Collins, Zhigang Chen, Kartik Ramaswamy, James D. Carducci, Shahid Rauf | 2014-02-18 |
| 8578879 | Apparatus for VHF impedance match tuning | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Lawrence Wong, Samer Banna | 2013-11-12 |
| 8496756 | Methods for processing substrates in process systems having shared resources | James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more | 2013-07-30 |
| 8414736 | Plasma reactor with tiltable overhead RF inductive source | Kenneth S. Collins, Martin Jeffrey Salinas, Imad Yousif, Ming Xu | 2013-04-09 |
| 8360003 | Plasma reactor with uniform process rate distribution by improved RF ground return path | Hiroji Hanawa, Kartik Ramaswamy, Samer Banna, Anchel Sheyner, Valentin N. Todorow | 2013-01-29 |
| 8279577 | Substrate support having fluid channel | Wing Cheng, Hiroji Hanawa, Semyon L. Kats, Kartik Ramaswamy, Yan Ye +4 more | 2012-10-02 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-20 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-13 |
| 8058156 | Plasma immersion ion implantation reactor having multiple ion shower grids | Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy | 2011-11-15 |
| 7988815 | Plasma reactor with reduced electrical skew using electrical bypass elements | Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa +5 more | 2011-08-02 |
| 7972469 | Plasma processing apparatus | Hiroji Hanawa, Keiji Horioka, Kallol Bera, Kenneth S. Collins, Lawrence Wong +3 more | 2011-07-05 |
| 7967996 | Process for wafer backside polymer removal and wafer front side photoresist removal | Kenneth S. Collins, Hiroji Hanawa, Shahid Rauf, Ajit Balakrishna, Valentin N. Todorow +6 more | 2011-06-28 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-06-28 |
| 7884025 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-08 |
| 7879731 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-01 |
| 7780866 | Method of plasma confinement for enhancing magnetic control of plasma radial distribution | Matthew L. Miller, Daniel J. Hoffman, Steven C. Shannon, Michael Kutney, James D. Carducci | 2010-08-24 |
| 7767561 | Plasma immersion ion implantation reactor having an ion shower grid | Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy | 2010-08-03 |
| 7768765 | Substrate support having heat transfer system | Wing Cheng, Hiroji Hanawa, Semyon L. Kats, Kartik Ramaswamy, Yan Ye +4 more | 2010-08-03 |
| 7700465 | Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo +1 more | 2010-04-20 |