Issued Patents All Time
Showing 101–115 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7183177 | Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement | Amir Al-Bayati, Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Biagio Gallo | 2007-02-27 |
| 7166524 | Method for ion implanting insulator material to reduce dielectric constant | Amir Al-Bayati, Rick J. Roberts, Kenneth S. Collins, Ken MacWilliams, Hiroji Hanawa +2 more | 2007-01-23 |
| 7137354 | Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo +1 more | 2006-11-21 |
| 7109098 | Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2006-09-19 |
| 7094670 | Plasma immersion ion implantation process | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo | 2006-08-22 |
| 7094316 | Externally excited torroidal plasma source | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Tsutomu Tanaka, Yan Ye | 2006-08-22 |
| 7037813 | Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo +1 more | 2006-05-02 |
| 6939434 | Externally excited torroidal plasma source with magnetic control of ion distribution | Kenneth S. Collins, Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Michael Barnes +1 more | 2005-09-06 |
| 6893907 | Fabrication of silicon-on-insulator structure using plasma immersion ion implantation | Dan Maydan, Randir P. S. Thakur, Kenneth S. Collins, Amir Al-Bayati, Hiroji Hanawa +2 more | 2005-05-17 |
| 6551446 | Externally excited torroidal plasma source with a gas distribution plate | Hiroji Hanawa, Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Tsutomu Tanaka | 2003-04-22 |
| 6494986 | Externally excited multiple torroidal plasma source | Hiroji Hanawa, Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Tsutomu Tanaka | 2002-12-17 |
| 6468388 | Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate | Hiroji Hanawa, Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Tsutomu Tanaka | 2002-10-22 |
| 6453842 | Externally excited torroidal plasma source using a gas distribution plate | Hiroji Hanawa, Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Tsutomu Tanaka | 2002-09-24 |
| 6410449 | Method of processing a workpiece using an externally excited torroidal plasma source | Hiroji Hanawa, Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Tsutomu Tanaka | 2002-06-25 |
| 6348126 | Externally excited torroidal plasma source | Hiroji Hanawa, Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Tsutomu Tanaka | 2002-02-19 |