Issued Patents All Time
Showing 76–100 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7695590 | Chemical vapor deposition plasma reactor having plural ion shower grids | Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy | 2010-04-13 |
| 7666464 | RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo | 2010-02-23 |
| 7642180 | Semiconductor on insulator vertical transistor fabrication and doping process | Amir Al-Bayati, Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Biagio Gallo | 2010-01-05 |
| 7552736 | Process for wafer backside polymer removal with a ring of plasma under the wafer | Kenneth S. Collins, Hiroji Hanawa, Ajit Balakrishna, David Palagashvili, James P. Cruse +7 more | 2009-06-30 |
| 7479456 | Gasless high voltage high contact force wafer contact-cooling electrostatic chuck | Douglas A. Buchberger, Jr., Daniel J. Hoffman, Kartik Ramaswamy, Hiorji Hanawa, Kenneth S. Collins +1 more | 2009-01-20 |
| 7465478 | Plasma immersion ion implantation process | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo | 2008-12-16 |
| 7430984 | Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements | Hiroji Hanawa, Kartik Ramaswamy, Kenneth S. Collins, Gonzalo Monroy | 2008-10-07 |
| 7428915 | O-ringless tandem throttle valve for a plasma reactor chamber | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo | 2008-09-30 |
| 7429532 | Semiconductor substrate process using an optically writable carbon-containing mask | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-09-30 |
| 7422775 | Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-09-09 |
| 7393765 | Low temperature CVD process with selected stress of the CVD layer on CMOS devices | Hiroji Hanawa, Kartik Ramaswamy, Kenneth S. Collins, Amir Al-Bayati, Biagio Gallo | 2008-07-01 |
| 7335611 | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-02-26 |
| 7323401 | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-01-29 |
| 7320734 | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo +1 more | 2008-01-22 |
| 7312162 | Low temperature plasma deposition process for carbon layer deposition | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2007-12-25 |
| 7312148 | Copper barrier reflow process employing high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2007-12-25 |
| 7303982 | Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo +1 more | 2007-12-04 |
| 7294563 | Semiconductor on insulator vertical transistor fabrication and doping process | Amir Al-Bayati, Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Biagio Gallo | 2007-11-13 |
| 7291545 | Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo +1 more | 2007-11-06 |
| 7291360 | Chemical vapor deposition plasma process using plural ion shower grids | Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy | 2007-11-06 |
| 7292428 | Electrostatic chuck with smart lift-pin mechanism for a plasma reactor | Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Biagio Gallo, Amir Al-Bayati | 2007-11-06 |
| 7288491 | Plasma immersion ion implantation process | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo | 2007-10-30 |
| 7244474 | Chemical vapor deposition plasma process using an ion shower grid | Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy | 2007-07-17 |
| 7223676 | Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer | Hiroji Hanawa, Kartik Ramaswamy, Kenneth S. Collins, Amir Al-Bayati, Biagio Gallo | 2007-05-29 |
| 7221553 | Substrate support having heat transfer system | Wing Cheng, Hiroji Hanawa, Semyon L. Kats, Kartik Ramaswamy, Yan Ye +4 more | 2007-05-22 |