Issued Patents All Time
Showing 26–50 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10453656 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2019-10-22 |
| 10446418 | Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductance | Yogananda Sarode Vishwanath, Tom K. Cho | 2019-10-15 |
| 10386126 | Apparatus for controlling temperature uniformity of a substrate | Kallol Bera, Xiaoping Zhou, Douglas A. Buchberger, Jr., Hamid Tavassoli, Surajit Kumar +1 more | 2019-08-20 |
| 10170278 | Inductively coupled plasma source | Kartik Ramaswamy, Yang Yang, Steven Lane | 2019-01-01 |
| 10153139 | Multiple electrode substrate support assembly and phase control system | Yang Yang, Kartik Ramaswamy, Steven Lane, Lawrence Wong, Shahid Rauf +2 more | 2018-12-11 |
| 10131994 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2018-11-20 |
| 10096494 | Substrate support with symmetrical feed structure | Xing Lin, Douglas A. Buchberger, Jr., Xiaoping Zhou, Anchel Sheyner | 2018-10-09 |
| 10017857 | Method and apparatus for controlling plasma near the edge of a substrate | Yang Yang, Kartik Ramaswamy, Steven Lane, Lawrence Wong | 2018-07-10 |
| 10010912 | Particle reduction via throttle gate valve purge | Jared Ahmad Lee, Dmitry Lubomirsky, Martin Jeff Salinas, Tom K. Cho, Eric A. Englhardt +1 more | 2018-07-03 |
| 9947559 | Thermal management of edge ring in semiconductor processing | Aniruddha Pal, Martin Jeffrey Salinas, Dmitry Lubomirsky, Imad Yousif | 2018-04-17 |
| 9896769 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2018-02-20 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom K. Cho, Kenneth S. Collins +3 more | 2017-09-12 |
| 9745663 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2017-08-29 |
| 9741546 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more | 2017-08-22 |
| 9646843 | Tunable magnetic field to improve uniformity | Tza-Jing Gung, Haitao Wang, Maxim Mikhailovich Noginov, Reza Sadjadi, Chunlei Zhang +1 more | 2017-05-09 |
| 9601301 | Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment | Sergey G. Belostotskiy, Chinh Dinh, Michael G. Chafin | 2017-03-21 |
| 9449794 | Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna | Kartik Ramaswamy, Jason A. Kenney, Shahid Rauf, Kenneth S. Collins, Yang Yang +2 more | 2016-09-20 |
| 9368370 | Temperature ramping using gas distribution plate heat | Sergey G. Belostotskiy, Chinh Dinh, Qingjun Zhou, Srinivas D. Nemani | 2016-06-14 |
| 9330887 | Plasma reactor with tiltable overhead RF inductive source | Kenneth S. Collins, Martin Jeffrey Salinas, Imad Yousif, Ming Xu | 2016-05-03 |
| 9287095 | Semiconductor system assemblies and methods of operation | Kartik Ramaswamy, Srinivas D. Nemani, Bradley J. Howard, Yogananda Sarode Vishwanath | 2016-03-15 |
| 9267742 | Apparatus for controlling the temperature uniformity of a substrate | Kallol Bera, Xiaoping Zhou, Douglas A. Buchberger, Jr., Hamid Tavassoli, Surajit Kumar +1 more | 2016-02-23 |
| 9162236 | Proportional and uniform controlled gas flow delivery for dry plasma etch apparatus | Roy C. Nangoy | 2015-10-20 |
| 9123762 | Substrate support with symmetrical feed structure | Xing Lin, Douglas A. Buchberger, Jr., Xiaoping Zhou, Anchel Sheyner | 2015-09-01 |
| 9111722 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Leonid Dorf, Shahid Rauf, Jonathan Liu, Jason A. Kenney, Kenneth S. Collins +2 more | 2015-08-18 |
| 9082591 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Leonid Dorf, Shahid Rauf, Jonathan Liu, Jason A. Kenney, Kenneth S. Collins +2 more | 2015-07-14 |