Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11322337 | Plasma processing system workpiece carrier with thermally isolated heater plate blocks | Dmitry Lubomirsky, Son T. Nguyen, Anh N. Nguyen | 2022-05-03 |
| 11302520 | Chamber apparatus for chemical etching of dielectric materials | Tien Fak Tan, Dmitry Lubomirsky, Kirby H. Floyd, Son T. Nguyen, Alexander Tam +1 more | 2022-04-12 |
| 10083816 | Shielded lid heater assembly | Michael D. Willwerth, Valentin N. Todorow, Stephen Yuen | 2018-09-25 |
| 9639097 | Component temperature control by coolant flow control and heater duty cycle control | Chetan Mahadeswaraswamy, Kartik Ramaswamy, Bryan Liao, Sergio Fukuda Shoji, Duy D. Nguyen +1 more | 2017-05-02 |
| 9443753 | Apparatus for controlling the flow of a gas in a process chamber | Michael D. Willwerth, Jingbao Liu | 2016-09-13 |
| 9362148 | Shielded lid heater assembly | Michael D. Willwerth, Valentin N. Todorow, Stephen Yuen | 2016-06-07 |
| 9070536 | Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface | Michael D. Willwerth, Michael G. Chafin, Ying-Sheng Lin | 2015-06-30 |
| 8880227 | Component temperature control by coolant flow control and heater duty cycle control | Chetan Mahadeswaraswamy, Kartik Ramaswamy, Bryan Liao, Sergio Fukuda Shoji, Duy D. Nguyen +1 more | 2014-11-04 |
| 8840725 | Chamber with uniform flow and plasma distribution | Michael D. Willwerth, ALEX ERENSTEIN, Jingbao Liu | 2014-09-23 |
| 8757603 | Low force substrate lift | Michael D. Willwerth | 2014-06-24 |
| 8580693 | Temperature enhanced electrostatic chucking in plasma processing apparatus | Sergey G. Belostotskiy, Michael G. Chafin, Jingbao Liu | 2013-11-12 |
| 8501626 | Methods for high temperature etching a high-K material gate structure | Wei Liu, Eiichi Matsusue, Meihua Shen, Shashank Deshmukh, Anh Phan +4 more | 2013-08-06 |
| 8419893 | Shielded lid heater assembly | Michael D. Willwerth, Valentin N. Todorow, Stephen Yuen | 2013-04-16 |
| 8383002 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson | 2013-02-26 |
| 8270141 | Electrostatic chuck with reduced arcing | Michael D. Willwerth, Douglas A. Buchberger, Jr., Michael G. Chafin | 2012-09-18 |
| 8236133 | Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias | Dan Katz, Brian K. Hatcher, Theodoros Panagopoulos, Valentin N. Todorow, Edward P. Hammond, IV +2 more | 2012-08-07 |
| 7879250 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson | 2011-02-01 |
| 7832354 | Cathode liner with wafer edge gas injection in a plasma reactor chamber | Dan Katz, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson | 2010-11-16 |
| 7552736 | Process for wafer backside polymer removal with a ring of plasma under the wafer | Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Ajit Balakrishna, James P. Cruse +7 more | 2009-06-30 |
| 6962644 | Tandem etch chamber plasma processing system | Alexander Paterson, Valentin Todorov, Jon McChesney, Gerhard Schneider, John Holland +1 more | 2005-11-08 |
| 6818096 | Plasma reactor electrode | Michael Barnes | 2004-11-16 |
| 6692903 | Substrate cleaning apparatus and method | Haojiang Chen, James S. Papanu, Mark Kawaguchi, Harald Herchen, Jeng H. Hwang +1 more | 2004-02-17 |
| 6444040 | Gas distribution plate | Harald Herchen, Dmitry Lubomirsky, Alex Schreiber | 2002-09-03 |
| 6369493 | Microwave plasma applicator having a thermal transfer medium between a plasma containing tube and a cooling jacket | Dmitry Lubomirsky, Harald Herchen, Simon Yavelberg, Donald Olgado | 2002-04-09 |
| 6120608 | Workpiece support platen for semiconductor process chamber | Norman Shendon, James S. Papanu | 2000-09-19 |