Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510590 | Low resistivity films containing molybdenum | Shruti Vivek Thombare, Raashina Humayun, Michal Danek, Chiukin Steven Lai, Joshua Collins +3 more | 2019-12-17 |
| 10388546 | Apparatus for UV flowable dielectric | Jonathan D. Mohn, Nicholas Muga Ndiege, David Fang Wei Chen, Wenbo Liang, Shawn M. Hamilton | 2019-08-20 |
| 10373806 | Apparatus and method for deposition and etch in gap fill | Akhil Singhal, Martin E. Freeborn, Bart J. van Schravendijk | 2019-08-06 |
| 10262943 | Interlevel conductor pre-fill utilizing selective barrier deposition | Artur Kolics, William T. Lee, Larry Zhao, Derek Wong, Praveen Nalla +2 more | 2019-04-16 |
| 10246774 | Additive for ALD deposition profile tuning in gap features | — | 2019-04-02 |
| 10128116 | Integrated direct dielectric and metal deposition | William T. Lee, Bart J. van Schravendijk, David Charles Smith, Michal Danek, Ramesh Chandrasekharan | 2018-11-13 |
| 10049921 | Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor | Nerissa Draeger, Kaihan Ashtiani, Deenesh Padhi, Derek Wong, Bart J. van Schravendijk +3 more | 2018-08-14 |
| 9916977 | Low k dielectric deposition via UV driven photopolymerization | Nicholas Muga Ndiege, Jonathan D. Mohn | 2018-03-13 |
| 9875968 | Interlevel conductor pre-fill utilizing selective barrier deposition | Artur Kolics, William T. Lee, Larry Zhao, Derek Wong, Praveen Nalla +2 more | 2018-01-23 |
| 9824893 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Richard Wise, Arpan Mahorowala, Bart J. van Schravendijk | 2017-11-21 |
| 9773643 | Apparatus and method for deposition and etch in gap fill | Akhil Singhal, Martin E. Freeborn, Bart J. van Schravendijk | 2017-09-26 |
| 9583386 | Interlevel conductor pre-fill utilizing selective barrier deposition | Artur Kolics, William T. Lee, Larry Zhao, Derek Wong, Praveen Nalla +2 more | 2017-02-28 |
| 9245739 | Low-K oxide deposition by hydrolysis and condensation | Nicholas Muga Ndiege, Krishna Nittala, Derek Wong, George Andrew Antonelli, Nerissa Draeger | 2016-01-26 |
| 7700155 | Method and apparatus for modulation of precursor exposure during a pulsed deposition process | Francisco Juarez, Dennis M. Hausmann, Bunsen B. Nie, Teresa Pong, Adrianne K. Tipton | 2010-04-20 |
| 7208389 | Method of porogen removal from porous low-k films using UV radiation | Adrianne K. Tipton, Brian Lu, Michelle T. Schulberg, Qingguo Wu, Haiying Fu +1 more | 2007-04-24 |
| 7176144 | Plasma detemplating and silanol capping of porous dielectric films | Feng Wang, Michelle T. Schulberg, Jianing Sun, Raashina Humayun | 2007-02-13 |
| 6951765 | Method and apparatus for introduction of solid precursors and reactants into a supercritical fluid reactor | Sanjay Gopinath, Michelle T. Schulberg, Sasangan Ramanathan, Francisco Juarez, Patrick Joyce | 2005-10-04 |
| 6867152 | Properties of a silica thin film produced by a rapid vapor deposition (RVD) process | Dennis M. Hausmann, Adrianne K. Tipton, Bunsen B. Nie, Francisco Juarez, Teresa Pong | 2005-03-15 |
| 6846391 | Process for depositing F-doped silica glass in high aspect ratio structures | George D. Papasouliotis, Robert Tas, Bart J. van Schravendijk | 2005-01-25 |
| 6766810 | Methods and apparatus to control pressure in a supercritical fluid reactor | — | 2004-07-27 |
| 6576345 | Dielectric films with low dielectric constants | Ravi Laxman, Jen Shu, Michelle T. Schulberg, Bunsen B. Nie | 2003-06-10 |
| 6550484 | Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing | Sanjay Gopinath, Francisco Juarez, Krishnan Shrinivasan | 2003-04-22 |
| 6395150 | Very high aspect ratio gapfill using HDP | George D. Papasouliotis, Mark A. Logan, Bart J. van Schravendijk, William J. King | 2002-05-28 |
| 6340628 | Method to deposit SiOCH films with dielectric constant below 3.0 | Ravi Laxman, Jen Shu, Michelle T. Schulberg, Bunsen B. Nie | 2002-01-22 |
| 6258653 | Silicon nitride barrier for capacitance maximization of tantalum oxide capacitor | Kok Heng Chew, Kathy Konjuh, Tirunelveli S. Ravi | 2001-07-10 |