Issued Patents All Time
Showing 25 most recent of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12282256 | Photoresist deposition using independent multichannel showerhead | Farzad Houshmand, Wayne French, Kelvin Chan, Lakmal C. Kalutarage, Mark Saly | 2025-04-22 |
| 12170186 | Showerhead assembly with heated showerhead | Seyyed A. Fazeli, Yang Guo, Chandrashekara Baginagere, Ramcharan Sundar, Yunho Kim +1 more | 2024-12-17 |
| 12142458 | Symmetric plasma source to generate pie-shaped treatment | Farzad Houshmand, Philip Allan Kraus, Abhishek Chowdhury, John C. Forster, Kallol Bera | 2024-11-12 |
| 12012652 | Single process volume to perform high-pressure and low-pressure processes with features to reduce cross-contamination | Kelvin Chan, Yang Guo, Ashish Goel, Philip Allan Kraus | 2024-06-18 |
| 11982359 | Isolation valve | Benjamin B. Riordon, Charles T. Carlson | 2024-05-14 |
| 11946140 | Hot showerhead | Seyyed A. Fazeli, Yang Guo, Ramcharan Sundar, Arun Kumar Kotrappa, Steven Mosbrucker +5 more | 2024-04-02 |
| 11830710 | Internally divisible process chamber using a shutter disk assembly | John Mazzocco, Yang Guo | 2023-11-28 |
| 11823871 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar +3 more | 2023-11-21 |
| 11802340 | UHV in-situ cryo-cool chamber | Bharath Swaminathan, John Mazzocco, Hanbing Wu, Ashish Goel | 2023-10-31 |
| 11600476 | Deposition system with multi-cathode and method of manufacture thereof | Deepak Jadhav, Ashish Goel, Hanbing Wu, Prashanth Kothnur, Chi Hong Ching | 2023-03-07 |
| 11575071 | Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devices | Mingwei Zhu, Nag B. Patibandla, Rongjun Wang, Daniel Lee Diehl, Vivek Agrawal | 2023-02-07 |
| 11551905 | Resonant process monitor | Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Kelvin Chan, Michael D. Willwerth +5 more | 2023-01-10 |
| 11545347 | Internally divisible process chamber using a shutter disk assembly | John Mazzocco, Yang Guo | 2023-01-03 |
| 11446740 | Multiple sequential linear powder dispensers for additive manufacturing | Christopher A. Rowland, Kasiraman Krishnan, Kartik Ramaswamy, Thomas Brezoczky, Swaminathan Srinivasan +5 more | 2022-09-20 |
| 11371148 | Fabricating a recursive flow gas distribution stack using multiple layers | Sumit Agarwal, Yang Guo, Siva Chandrasekar | 2022-06-28 |
| 11368003 | Seamless electrical conduit | Philip Allan Kraus | 2022-06-21 |
| 11335543 | RF return path for reduction of parasitic plasma | Arun Kumar Kotrappa, Hanish Kumar, Ramcharan Sundar | 2022-05-17 |
| 11315769 | Plasma source for rotating susceptor | Kallol Bera, John C. Forster, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen | 2022-04-26 |
| 11315763 | Shaped electrodes for improved plasma exposure from vertical plasma source | Kallol Bera, Dmitry A. Dzilno, John C. Forster, Tsutomu Tanaka | 2022-04-26 |
| 11289312 | Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability | Adolph Miller Allen, Vanessa Faune, Zhong Qiang Hua, Kirankumar Neelasandra SAVANDAIAH, Philip Allan Kraus +5 more | 2022-03-29 |
| 11189502 | Showerhead with interlaced gas feed and removal and methods of use | Kallol Bera, Shahid Rauf, James D. Carducci, Vladimir Knyazik | 2021-11-30 |
| 11183375 | Deposition system with multi-cathode and method of manufacture thereof | Deepak Jadhav, Ashish Goel, Hanbing Wu, Prashanth Kothnur, Chi Hong Ching | 2021-11-23 |
| 11170982 | Methods and apparatus for producing low angle depositions | Praburam Gopal Raja, Steven V. Sansoni, John C. Forster, Philip Allan Kraus, Yang Guo +5 more | 2021-11-09 |
| 11101117 | Methods and apparatus for co-sputtering multiple targets | Hanbing Wu, Wei Wang, Ashish Goel, Srinivas Guggilla, Lavinia Nistor | 2021-08-24 |
| 11081623 | Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices | Mingwei Zhu, Nag B. Patibandla, Rongjun Wang, Daniel Lee Diehl, Vivek Agrawal | 2021-08-03 |