Issued Patents All Time
Showing 76–98 of 98 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7776732 | Metal high-K transistor having silicon sidewall for reduced parasitic capacitance, and process to fabricate same | Leland Chang, Isaac Lauer, Jeffrey W. Sleight | 2010-08-17 |
| 7767579 | Protection of SiGe during etch and clean operations | Ashima B. Chakravarti, Zhijiong Luo, Shreesh Narasimha, Katsunori Onishi | 2010-08-03 |
| 7754594 | Method for tuning the threshold voltage of a metal gate and high-k device | Michael P. Chudzik, Michael A. Gribelyuk, Rashmi Jha, Naim Moumen, Keith Kwong Hon Wong | 2010-07-13 |
| 7652332 | Extremely-thin silicon-on-insulator transistor with raised source/drain | Eduard A. Cartier, Steven J. Koester, Kingsuk Maitra, Amlan Majumdar | 2010-01-26 |
| 7648868 | Metal-gated MOSFET devices having scaled gate stack thickness | Amlan Majumdar, Zhibin Ren, Jeffrey W. Sleight | 2010-01-19 |
| 7618891 | Method for forming self-aligned metal silicide contacts | Sunfei Fang, Randolph F. Knarr, Mahadevaiyer Krishnan, Christian Lavoie, Balasubramanian Pranatharthiharan +1 more | 2009-11-17 |
| 7611979 | Metal gates with low charge trapping and enhanced dielectric reliability characteristics for high-k gate dielectric stacks | Alessandro C. Callegari, Michael P. Chudzik, Barry P. Linder, Vijay Narayanan, Dae-Gyu Park +2 more | 2009-11-03 |
| 7544610 | Method and process for forming a self-aligned silicide contact | Cyril Cabral, Jr., Michael A. Cobb, Asa Frye, Balasubramanian S. Pranatharthi Haran, Randolph F. Knarr +5 more | 2009-06-09 |
| 7518145 | Integrated multiple gate dielectric composition and thickness semiconductor chip and method of manufacturing the same | Anthony I. Chou, Shreesh Narasimha | 2009-04-14 |
| 7498271 | Nitrogen based plasma process for metal gate MOS device | Ricardo A. Donaton, Rashmi Jha, Siddarth A. Krishnan, Xi Li, Naim Moumen +3 more | 2009-03-03 |
| 7491964 | Nitridation of STI fill oxide to prevent the loss of STI fill oxide during manufacturing process | Fred Buehrer, Anthony I. Chou, Toshiharu Furukawa | 2009-02-17 |
| 7491563 | Nitridation of STI fill oxide to prevent the loss of STI fill oxide during manufacturing process | Fred Buehrer, Anthony I. Chou, Toshiharu Furukawa | 2009-02-17 |
| 7446005 | Manufacturable recessed strained RSD structure and process for advanced CMOS | Brian W. Messenger, Dominic J. Schepis | 2008-11-04 |
| 7358130 | Method for monitoring lateral encroachment of spacer process on a CD SEM | Bachir Dirahoui, Ravikumar Ramachandran, Eric P. Solecky | 2008-04-15 |
| 7344983 | Clustered surface preparation for silicide and metal contacts | Sadanand V. Deshpande, Ying Li, Kevin E. Mello, Wesley C. Natzle, Kirk D. Peterson +1 more | 2008-03-18 |
| 7115955 | Semiconductor device having a strained raised source/drain | Brian W. Messenger, Dominic J. Schepis | 2006-10-03 |
| 7105398 | Method for monitoring lateral encroachment of spacer process on a CD SEM | Bachir Dirahoui, Ravikumar Ramachandran, Eric P. Solecky | 2006-09-12 |
| 7091128 | Method for avoiding oxide undercut during pre-silicide clean for thin spacer FETs | Atul Ajmera, Andres Bryant, Percy V. Gilbert, Michael A. Gribelyuk, Edward P. Maciejewski +1 more | 2006-08-15 |
| 7071103 | Chemical treatment to retard diffusion in a semiconductor overlayer | Kevin K. Chan, Huajie Chen, Michael A. Gribelyuk, Judson R. Holt, Woo-Hyeong Lee +5 more | 2006-07-04 |
| 7071072 | Forming shallow trench isolation without the use of CMP | Shreesh Narasimha | 2006-07-04 |
| 7002214 | Ultra-thin body super-steep retrograde well (SSRW) FET devices | Diane C. Boyd, Judson R. Holt, Meikei Ieong, Zhibin Ren, Ghavam G. Shahidi | 2006-02-21 |
| 6991979 | Method for avoiding oxide undercut during pre-silicide clean for thin spacer FETs | Atul Ajmera, Andres Bryant, Percy V. Gilbert, Michael A. Gribelyuk, Edward P. Maciejewski +1 more | 2006-01-31 |
| 6790733 | Preserving TEOS hard mask using COR for raised source-drain including removable/disposable spacer | Wesley C. Natzle, Bruce B. Doris, Sadanand V. Deshpande, Patricia A. O'Neil | 2004-09-14 |