Issued Patents All Time
Showing 76–100 of 114 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6897956 | Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device | Masahiko Nakada, Takahiko Suzuki, Taketo Ueno, Toshihiko Nakata, Shunji Maeda | 2005-05-24 |
| 6894302 | Surface inspection apparatus and method thereof | Ichiro Ishimaru, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou +2 more | 2005-05-17 |
| 6894773 | Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process | Hiroshi Morioka, Yoshimasa Ohshima, Yukio Kembo, Hidetoshi Nishiyama, Kazuhiko Matsuoka +1 more | 2005-05-17 |
| 6888959 | Method of inspecting a semiconductor device and an apparatus thereof | Akira Hamamatsu, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya +4 more | 2005-05-03 |
| 6841403 | Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect data | Maki Tanaka, Shunji Maeda, Takafumi Okabe, Yuji Takagi, Chie Shishido | 2005-01-11 |
| 6806970 | Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same | Takenori Hirose, Yukio Kenbo, Shunji Maeda, Takanori Ninomiya, Hirofumi Tsuchiyama | 2004-10-19 |
| 6797526 | Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect data | Maki Tanaka, Shunji Maeda, Takafumi Okabe, Yuji Takagi, Chie Shishido | 2004-09-28 |
| 6797975 | Method and its apparatus for inspecting particles or defects of a semiconductor device | Hidetoshi Nishiyama, Yoshimasa Ooshima, Akira Hamamatsu, Kenji Watanabe, Tetsuya Watanabe +1 more | 2004-09-28 |
| 6753972 | Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same | Takenori Hirose, Yukio Kenbo, Shunji Maeda, Takanori Ninomiya, Hirofumi Tsuchiyama | 2004-06-22 |
| 6731384 | Apparatus for detecting foreign particle and defect and the same method | Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Mitomo, Takashi Okawa, Akira Hamamatsu +1 more | 2004-05-04 |
| 6657221 | Image classification method, observation method, and apparatus thereof with different stage moving velocities | Ryo Nakagaki, Yuji Takagi, Takashi Hiroi, Masahiro Watanabe, Kazuo Aoki | 2003-12-02 |
| 6654112 | Apparatus and method for inspecting defects | Shunji Maeda, Yukihiro Shibata, Takanori Ninomiya | 2003-11-25 |
| 6650409 | Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system | Yukio Kembo, Hiroshi Morioka, Hidetoshi Nishiyama, Hideaki Doi, Masataka Shiba +6 more | 2003-11-18 |
| 6597448 | Apparatus and method of inspecting foreign particle or defect on a sample | Hidetoshi Nishiyama, Yoshimasa Ohshima, Tetsuya Watanabe, Hisato Nakamura, Takahiro Jingu +3 more | 2003-07-22 |
| 6485891 | Exposure apparatus and method | Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama | 2002-11-26 |
| 6411377 | Optical apparatus for defect and particle size inspection | Yoshimasa Ohshima, Hidetoshi Nishiyama, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga +7 more | 2002-06-25 |
| 6400454 | Apparatus and method for inspector defects | Shunji Maeda, Yukihiro Shibata, Takanori Ninomiya | 2002-06-04 |
| 6335146 | Exposure apparatus and method | Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama | 2002-01-01 |
| 6281024 | Semiconductor device inspection and analysis method and its apparatus and a method for manufacturing a semiconductor device | Yasuhiro Yoshitake, Kenji Watanabe, Yoshimasa Fukushima | 2001-08-28 |
| 6229913 | Apparatus and methods for determining the three-dimensional shape of an object using active illumination and relative blurring in two-images due to defocus | Shree K. Nayar, Masahiro Wantanabe | 2001-05-08 |
| 6016187 | Exposure apparatus and method | Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama | 2000-01-18 |
| 5767949 | Exposure apparatus and method | Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama | 1998-06-16 |
| 5526094 | Exposure apparatus and method | Yukio Kenbo, Yoshitada Oshida, Masataka Shiba, Yasuhiro Yoshitaka, Makoto Murayama | 1996-06-11 |
| 5463459 | Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process | Hiroshi Morioka, Yoshimasa Ohshima, Yukio Kembo, Hidetoshi Nishiyama, Kazuhiko Matsuoka +1 more | 1995-10-31 |
| 5410400 | Foreign particle inspection apparatus | Hiroaki Shishido | 1995-04-25 |