Issued Patents All Time
Showing 51–75 of 101 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5882165 | Multiple chamber integrated process system | Sasson Somekh, David N. Wang, David Cheng, Masato Toshima, Isaac Harari +1 more | 1999-03-16 |
| 5874362 | Bromine and iodine etch process for silicon and silicides | Jerry Wong, David N. Wang, Mei Chang, Alfred Mak | 1999-02-23 |
| 5871811 | Method for protecting against deposition on a selected region of a substrate | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1999-02-16 |
| 5855681 | Ultra high throughput wafer vacuum processing system | Sasson Somekh, Ashok Sinha, Kevin Fairbairn, Christopher T. Lane, Kelly Colborne +2 more | 1999-01-05 |
| 5849136 | High frequency semiconductor wafer processing apparatus and method | Donald M. Mintz, Hiroji Hanawa, Sasson Somekh, Kenneth S. Collins | 1998-12-15 |
| 5788778 | Deposition chamber cleaning technique using a high power remote excitation source | Quanyuan Shang, Kam S. Law | 1998-08-04 |
| 5773100 | PECVD of silicon nitride films | Mei Chang, David N. Wang, John M. White | 1998-06-30 |
| 5755886 | Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1998-05-26 |
| 5753133 | Method and apparatus for etching film layers on large substrates | Jerry Wong, Masato Toshima, Kam S. Law, Norman L. Turner | 1998-05-19 |
| 5746875 | Gas injection slit nozzle for a plasma process reactor | Steve S. Y. Mak, Donald Olgado, Gerald Yin, Timothy D. Driscoll, James S. Papanu +1 more | 1998-05-05 |
| 5720818 | Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck | Arik Donde, Robert Steger, Edwin C. Weldon, Brian Lue, Timothy Dyer | 1998-02-24 |
| 5643394 | Gas injection slit nozzle for a plasma process reactor | Steve S. Y. Mak, Donald Olgado, Gerald Yin, Timothy D. Driscoll, Brian Sy-Yuan Shieh +1 more | 1997-07-01 |
| 5618382 | High-frequency semiconductor wafer processing apparatus and method | Donald M. Mintz, Hiroji Hanawa, Sasson Somekh, Kenneth S. Collins | 1997-04-08 |
| 5567476 | Multi-step chemical vapor deposition method for thin film transistors | Kam S. Law, Robert Robertson, Michael Kollrack, Angela Lee, Takako Takehara +1 more | 1996-10-22 |
| 5441768 | Multi-step chemical vapor deposition method for thin film transistors | Kam S. Law, Robert Robertson, Michael Kollrack, Angela Lee, Takako Takehara +1 more | 1995-08-15 |
| 5399387 | Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates | Kam S. Law, Robert Robertson, Pamela Lou, Marc M. Kollrack, Angela Lee | 1995-03-21 |
| 5380566 | Method of limiting sticking of body to susceptor in a deposition treatment | Robert Robertson, Marc M. Kollrack, Angela Lee, Kam S. Law | 1995-01-10 |
| 5362526 | Plasma-enhanced CVD process using TEOS for depositing silicon oxide | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1994-11-08 |
| 5354715 | Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 1994-10-11 |
| 5300460 | UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers | Kenneth S. Collins, Craig A. Roderick, Chan-Lon Yang, David N. Wang | 1994-04-05 |
| 5294320 | Apparatus for cleaning a shield in a physical vapor deposition chamber | Sasson Somekh | 1994-03-15 |
| 5292393 | Multichamber integrated process system | Sasson Somekh, David N. Wang, David Cheng, Masato Toshima, Isaac Harari +1 more | 1994-03-08 |
| 5280983 | Semiconductor processing system with robotic autoloader and load lock | Sasson Somekh, Charles Ryan-Harris, Richard A. Seilheimer, David Cheng, Edward M. Abolnikov +5 more | 1994-01-25 |
| 5244841 | Method for planarizing an integrated circuit structure using low melting inorganic material and flowing while depositing | Jeffrey Marks, Kam S. Law, David N. Wang | 1993-09-14 |
| 5224809 | Semiconductor processing system with robotic autoloader and load lock | Sasson Somekh, Charles Ryan-Harris, Richard A. Seilheimer, David Cheng, Edward M. Abolnikov +5 more | 1993-07-06 |