Issued Patents 2002
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6495841 | Charged beam drawing apparatus | Atsushi Ando, Shunko Magoshi, Kazuyoshi Sugihara, Yuichiro Yamazaki, Motosuke Miyoshi +1 more | 2002-12-17 |
| 6495054 | Etching method and cleaning method of chemical vapor growth apparatus | Kazuhiro Eguchi, Masahiro Kiyotoshi, Katsuhiko Hieda, Soichi Yamazaki | 2002-12-17 |
| 6483083 | Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface | Hideaki Sakurai, Akitoshi Kumagae, Iwao Higashikawa, Shinichi Ito, Tsunetoshi Arikado | 2002-11-19 |
| 6475285 | Deposition apparatus | Hiroshi Ikegami, Nobuo Hayasaka, Shinichi Ito | 2002-11-05 |
| 6454819 | Composite particles and production process thereof, aqueous dispersion, aqueous dispersion composition for chemical mechanical polishing, and process for manufacture of semiconductor device | Hiroyuki Yano, Gaku Minamihaba, Yukiteru Matsui, Masayuki Motonari, Masayuki Hattori +1 more | 2002-09-24 |
| 6443808 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2002-09-03 |
| 6439971 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2002-08-27 |
| 6440843 | Semiconductor device and method for manufacturing the same | Junichi Wada, Atsuko Sakata, Tomio Katata, Takamasa Usui, Masahiko Hasunuma +3 more | 2002-08-27 |
| 6440644 | Planarization method and system using variable exposure | Takashi Sato, Junichiro Iba | 2002-08-27 |
| 6433428 | Semiconductor device with a dual damascene type via contact structure and method for the manufacture of same | Toru Watanabe | 2002-08-13 |
| 6425806 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2002-07-30 |
| 6423977 | Pattern size evaluation apparatus | Kei Hayasaki, Shinichi Ito, Kenji Kawano, Soichi Inoue | 2002-07-23 |
| 6414499 | Method for monitoring the shape of the processed surfaces of semiconductor devices and equipment for manufacturing the semiconductor devices | Hiroyuki Yano | 2002-07-02 |
| 6409780 | Water-laden solid matter of vapor-phase processed inorganic oxide particles and slurry for polishing and manufacturing method of semiconductor devices | Hiroyuki Yano, Nobuo Hayasaka, Akira Iio, Masayuki Hattori, Kiyonobu Kubota | 2002-06-25 |
| 6376911 | Planarized final passivation for semiconductor devices | James G. Ryan, Alexander Mitwalsky | 2002-04-23 |
| 6375823 | Plating method and plating apparatus | Tetsuo Matsuda, Hisashi Kaneko | 2002-04-23 |
| 6375545 | Chemical mechanical method of polishing wafer surfaces | Hiroyuki Yano, Gaku Minamihaba, Yukiteru Matsui, Nobuo Hayasaka, Akira Iio +2 more | 2002-04-23 |
| 6372285 | Method of forming liquid film | Shinichi Ito | 2002-04-16 |
| 6368951 | Semiconductor device manufacturing method and semiconductor device | Kazuyuki Higashi, Noriaki Matsunaga, Akihiro Kajita, Tetsuo Matsuda, Tadashi Iijima +5 more | 2002-04-09 |
| 6369423 | Semiconductor device with a thin gate stack having a plurality of insulating layers | Tokuhisa Ohiwa, Jeffrey P. Gambino, Jun-ichi Shiozawa | 2002-04-09 |
| 6365492 | Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device | Kyoichi Suguro | 2002-04-02 |
| 6354907 | Polishing apparatus including attitude controller for turntable and/or wafer carrier | Ichiju Satoh, Norio Kimura | 2002-03-12 |
| 6338670 | Method and system of manufacturing slurry for polishing, and method and system of manufacturing semiconductor devices | Yoshinori Yoshida | 2002-01-15 |
| 6335534 | Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes | Kyoichi Suguro, Atsushi Murakoshi | 2002-01-01 |
| 6334928 | Semiconductor processing system and method of using the same | Makoto Sekine, Nobuo Hayasaka | 2002-01-01 |