AA

Amir Al-Bayati

Applied Materials: 50 patents #158 of 7,310Top 3%
Overall (All Time): #52,922 of 4,157,543Top 2%
51
Patents All Time

Issued Patents All Time

Showing 1–25 of 51 patents

Patent #TitleCo-InventorsDate
9337072 Apparatus and method for substrate clamping in a plasma chamber Ganesh Balasubramanian, Amit Kumar BANSAL, Eller Y. Juco, Mohamad A. Ayoub, Hyung Joon Kim +11 more 2016-05-10
8902428 Process and apparatus for measuring the crystal fraction of crystalline silicon casted mono wafers Asaf Schlezinger 2014-12-02
8900405 Plasma immersion ion implantation reactor with extended cathode process ring Peter I. Porshnev, Majeed A. Foad, Kartik Ramaswamy, Biagio Gallo, Hiroji Hanawa +2 more 2014-12-02
8895842 High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells Shuran Sheng, Yong Kee Chae, Stefan Klein, Bhaskar Kumar 2014-11-25
8796769 Thermal flux annealing influence of buried species Dean Jennings 2014-08-05
8501568 Method of forming flash memory with ultraviolet treatment Mihaela Balseanu, Vladimir Zubkov, Li-Qun Xia, Atif Noori, Reza Arghavani +1 more 2013-08-06
8445075 Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k<2.5) dielectrics Huiwen Xu, Mei-Yee Shek, Li-Qun Xia, Derek R. Witty, Hichem M'Saad 2013-05-21
8288239 Thermal flux annealing influence of buried species Dean Jennings 2012-10-16
8252653 Method of forming a non-volatile memory having a silicon nitride charge trap layer Mihaela Balseanu, Vladimir Zubkov, Li-Qun Xia, Atif Noori, Reza Arghavani +1 more 2012-08-28
8197636 Systems for plasma enhanced chemical vapor deposition and bevel edge etching Ashish Shah, Dale R. DuBois, Ganesh Balasubramanian, Mark Fodor, Eui Kyoon Kim +7 more 2012-06-12
8058156 Plasma immersion ion implantation reactor having multiple ion shower grids Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen 2011-11-15
7879683 Methods and apparatus of creating airgap in dielectric layers for the reduction of RC delay Alexandros T. Demos, Kang Sub Yim, Mehul Naik, Zhenjiang Cui, Mihaela Balseanu +2 more 2011-02-01
7816205 Method of forming non-volatile memory having charge trap layer with compositional gradient Mihaela Balseanu, Vladimir Zubkov, Li-Qun Xia, Atif Noori, Reza Arghavani +1 more 2010-10-19
7777197 Vacuum reaction chamber with x-lamp heater Lester D'Cruz, Alexandros T. Demos, Dale R. DuBois, Khaled A. Elsheref, Naoyuki Iwasaki +4 more 2010-08-17
7767561 Plasma immersion ion implantation reactor having an ion shower grid Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen 2010-08-03
7700465 Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Biagio Gallo +1 more 2010-04-20
7695590 Chemical vapor deposition plasma reactor having plural ion shower grids Hiroji Hanawa, Tsutomu Tanaka, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen 2010-04-13
7666464 RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Biagio Gallo 2010-02-23
7642180 Semiconductor on insulator vertical transistor fabrication and doping process Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Biagio Gallo, Andrew Nguyen 2010-01-05
7566655 Integration process for fabricating stressed transistor structure Mihaela Balseanu, Jia-Sheng Lee, Mei-Yee Shek, Li-Qun Xia, Hichem M'Saad 2009-07-28
7482255 Method of ion implantation to reduce transient enhanced diffusion Houda Graoui, Majeed A. Foad 2009-01-27
7479456 Gasless high voltage high contact force wafer contact-cooling electrostatic chuck Douglas A. Buchberger, Jr., Daniel J. Hoffman, Kartik Ramaswamy, Andrew Nguyen, Hiorji Hanawa +1 more 2009-01-20
7465478 Plasma immersion ion implantation process Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Biagio Gallo 2008-12-16
7428915 O-ringless tandem throttle valve for a plasma reactor chamber Andrew Nguyen, Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Biagio Gallo 2008-09-30
7429532 Semiconductor substrate process using an optically writable carbon-containing mask Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more 2008-09-30