Issued Patents All Time
Showing 76–100 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10100408 | Edge hump reduction faceplate by plasma modulation | Sungwon Ha, Kwangduk Douglas Lee, Juan Carlos Rocha-Alvarez, Martin Jay Seamons, Ziqing Duan +5 more | 2018-10-16 |
| 10094486 | Method and system for supplying a cleaning gas into a process chamber | Ramprakash Sankarakrishnan, Dale R. Du Bois, Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Thomas Nowak +2 more | 2018-10-09 |
| 10060032 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-08-28 |
| 10030306 | PECVD apparatus and process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-07-24 |
| 9922819 | Wafer rotation in a semiconductor chamber | Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan, Robert W. Kim, Dale R. Du Bois, Kirby H. Floyd +2 more | 2018-03-20 |
| 9837265 | Gas flow profile modulated control of overlay in plasma CVD films | Prashant Kumar Kulshreshtha, Sudha Rathi, Praket P. Jha, Saptarshi Basu, Kwangduk Douglas Lee +5 more | 2017-12-05 |
| 9816187 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2017-11-14 |
| 9698571 | Triggered arc flash arrester and shield element for use therewith | John J. Shea, Paul J. Rollmann, Robert K. Smith | 2017-07-04 |
| 9593419 | Wafer rotation in a semiconductor chamber | Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan, Robert W. Kim, Dale R. Du Bois, Kirby H. Floyd +2 more | 2017-03-14 |
| 9546541 | Gas lift valves | Chao Wang, Weng Keong Tiong, Yushan Li | 2017-01-17 |
| 9524889 | Processing systems and apparatus adapted to process substrates in electronic device manufacturing | Steve Hongkham, Paul B. Reuter, Eric A. Englhardt, Xinglong Chen, JuanCarlos Rocha-Alvarez | 2016-12-20 |
| 9518456 | Coiled tubing deployed gas injection mandrel | Yazid Mohamed Bashir, Bjorn Staale Varnes | 2016-12-13 |
| 9490154 | Method of aligning substrate-scale mask with substrate | Abraham Ravid, Todd Egan, Paul Connors, Sergey Starik | 2016-11-08 |
| 9458537 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2016-10-04 |
| 9390910 | Gas flow profile modulated control of overlay in plasma CVD films | Prashant Kumar Kulshreshtha, Sudha Rathi, Praket P. Jha, Saptarshi Basu, Kwangduk Douglas Lee +5 more | 2016-07-12 |
| 9355876 | Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations | Paul B. Reuter, JuanCarlos Rocha-Alvarez, Jeffrey Barrett Robinson, Dale R. Du Bois, Paul Connors | 2016-05-31 |
| 9337072 | Apparatus and method for substrate clamping in a plasma chamber | Amit Kumar BANSAL, Eller Y. Juco, Mohamad A. Ayoub, Hyung Joon Kim, Karthik Janakiraman +11 more | 2016-05-10 |
| 9206511 | Method and system for supplying a cleaning gas into a process chamber | Ramprakash Sankarakrishnan, Dale R. Du Bois, Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Thomas Nowak +2 more | 2015-12-08 |
| 9157151 | Elimination of first wafer effect for PECVD films | Annamalai Lakshmanan, Francimar Schmitt, Bok Hoen Kim | 2015-10-13 |
| 9157730 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2015-10-13 |
| 9025299 | Triggered arc flash arrester and shield element for use therewith | John J. Shea, Paul J. Rollmann, Robert K. Smith | 2015-05-05 |
| 8778813 | Confined process volume PECVD chamber | Ramprakash Sankarakrishnan, Juan Carlos Rocha-Alvarez, Dale R. Du Bois, Mark Fodor, Jianhua Zhou +6 more | 2014-07-15 |
| 8591699 | Method and system for supplying a cleaning gas into a process chamber | Ramprakash Sankarakrishnan, Dale R. Du Bois, Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Thomas Nowak +2 more | 2013-11-26 |
| 8282734 | Methods to improve the in-film defectivity of PECVD amorphous carbon films | Deenesh Padhi, Chiu Chan, Sudha Rathi, Jianhua Zhou, Karthik Janakiraman +4 more | 2012-10-09 |
| 8197636 | Systems for plasma enhanced chemical vapor deposition and bevel edge etching | Ashish Shah, Dale R. DuBois, Mark Fodor, Eui Kyoon Kim, Chiu Chan +7 more | 2012-06-12 |