HO

Haruo Okano

KT Kabushiki Kaisha Toshiba: 82 patents #122 of 21,451Top 1%
TL Tokyo Electron Limited: 14 patents #474 of 5,567Top 9%
TO Toshiba: 4 patents #258 of 2,688Top 10%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
TL Tokyo Electron Yamanashi Limited: 1 patents #52 of 138Top 40%
TC Tokuda Seisakusho Co: 1 patents #4 of 28Top 15%
EB Ebara: 1 patents #1,014 of 1,611Top 65%
Tdk: 1 patents #2,493 of 3,796Top 70%
Overall (All Time): #18,088 of 4,157,543Top 1%
90
Patents All Time

Issued Patents All Time

Showing 26–50 of 90 patents

Patent #TitleCo-InventorsDate
5620815 Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask Shinichi Ito, Toru Watanabe, Katsuya Okumura 1997-04-15
5607718 Polishing method and polishing apparatus Yasutaka Sasaki, Mie Matsuo, Rempei Nakata, Junichi Wada, Nobuo Hayasaka +1 more 1997-03-04
5597341 Semiconductor planarizing apparatus Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Riichirou Aoki, Hiromi Yajima 1997-01-28
5591486 Method for forming a film on a substrate by activating a reactive gas Sadahisa Noguchi, Makoto Sekine 1997-01-07
5582640 Semiconductor device and its fabricating method Takako Okada, Shigeru Kambayashi, Moto Yabuki, Shinji Onga, Yoshitaka Tsunashima +1 more 1996-12-10
5561082 Method for forming an electrode and/or wiring layer by reducing copper oxide or silver oxide Mie Matsuo, Nobuo Hayasaka, Kyoichi Suguro, Hideshi Miyajima, Jun Wada 1996-10-01
5547787 Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask Shinichi Ito, Toru Watanabe, Katsuya Okumura 1996-08-20
5514904 Semiconductor device with monocrystalline gate insulating film Shinji Onga, Takako Okada, Kouichirou Inoue, Yoshiaki Matsushita, Kikuo Yamabe +1 more 1996-05-07
5514425 Method of forming a thin film Hitoshi Ito, Kyoichi Suguro, Nobuo Hayasaka, Shinji Himori, Kazuya Nagaseki +1 more 1996-05-07
5503901 Surface treatment method and surface treatment apparatus Takayuki Sakai, Hisataka Hayashi, Shigeyuki Takagi, Yutaka Uchida 1996-04-02
5491339 Charged particle detection device and charged particle radiation apparatus Tadashi Mitsui, Nozomu Harada, Motosuke Miyoshi, Makoto Sekine, Katsuya Okumura 1996-02-13
5474643 Plasma processing apparatus Junichi Arami, Tamio Endo, Shiro Koyama, Kazuo Kikuchi, Teruaki Shiraishi +3 more 1995-12-12
5470791 Method of manufacturing semiconductor device Kyoichi Suguro 1995-11-28
5466942 Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus Itsuko Sakai, Nobuo Hayasaka 1995-11-14
5458919 Method for forming a film on a substrate by activating a reactive gas Sadahisa Noguchi 1995-10-17
5445996 Method for planarizing a semiconductor device having a amorphous layer Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Riichirou Aoki, Hiromi Yajima 1995-08-29
5445710 Method of manufacturing semiconductor device Masaru Hori, Hiroyuki Yano, Keiji Horioka, Hisataka Hayashi, Sadayuki Jimbo +3 more 1995-08-29
5444207 Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field Makoto Sekine, Keiji Horioka, Katsuya Okumura, Isahiro Hasegawa, Masaki Narita 1995-08-22
5440157 Semiconductor integrated-circuit capacitor having a carbon film electrode Keitaro Imai, Tomonori Aoyama, Yasunori Okayama 1995-08-08
5437961 Method of manufacturing semiconductor device Hiroyuki Yano, Tohru Watanabe, Keiji Horioka 1995-08-01
5429995 Method of manufacturing silicon oxide film containing fluorine Yukio Nishiyama, Rempei Nakata, Nobuo Hayasaka, Riichirou Aoki, Takahito Nagamatsu +3 more 1995-07-04
5429730 Method of repairing defect of structure Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more 1995-07-04
5424246 Method of manufacturing semiconductor metal wiring layer by reduction of metal oxide Mie Matsuo, Nobuo Hayasaka, Kyoichi Suguro, Hideshi Miyajima, Jun Wada 1995-06-13
5413967 Method of manufacturing semiconductor devices Tetsuo Matsuda 1995-05-09
5413663 Plasma processing apparatus Masahiro Shimizu, Takayuki Fukasawa, Yuichiro Yamazaki, Motosuke Miyoshi, Katsuya Okumura 1995-05-09