Issued Patents All Time
Showing 51–75 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5411631 | Dry etching method | Masaru Hori, Michishige Aoyama, Masao Ito, Kei Hattori, Fumihiko Higuchi +1 more | 1995-05-02 |
| 5409862 | Method for making aluminum single crystal interconnections on insulators | Junichi Wada, Hisashi Kaneko, Kyoichi Suguro, Nobuo Hayasaka | 1995-04-25 |
| 5407786 | Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation | Shinishi Ito, Makoto Nakase | 1995-04-18 |
| 5387893 | Permanent magnet magnetic circuit and magnetron plasma processing apparatus | Masami Oguriyama, Isahiro Hasegawa, Junichi Arami, Hiromi Harada | 1995-02-07 |
| 5385763 | Method for forming a film on a substrate by activating a reactive gas | Sadahisa Noguchi, Makoto Sekine | 1995-01-31 |
| 5376211 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more | 1994-12-27 |
| 5312519 | Method of cleaning a charged beam apparatus | Itsuko Sakai, Nobuo Hayasaka | 1994-05-17 |
| 5310454 | Dry etching method | Tokuhisa Ohiwa, Hisataka Hayashi, Keiji Horioka, Takaya Matsushita, Isahiro Hasegawa +1 more | 1994-05-10 |
| 5304510 | Method of manufacturing a multilayered metallization structure in which the conductive layer and insulating layer are selectively deposited | Kyoichi Suguro | 1994-04-19 |
| 5302240 | Method of manufacturing semiconductor device | Masaru Hori, Hiroyuki Yano, Keiji Horioka, Hisataka Hayashi, Sadayuki Jimbo +3 more | 1994-04-12 |
| 5298112 | Method for removing composite attached to material by dry etching | Nobuo Hayasaka, Tsunetoshi Arikado, Keiji Horioka | 1994-03-29 |
| 5290733 | Method of manufacturing semiconductor devices including depositing aluminum on aluminum leads | Nobuo Hayasaka, Ayako Shimazaki | 1994-03-01 |
| 5289152 | Permanent magnet magnetic circuit | Masami Oguriyama, Yoshio Ishigaki, Isahiro Hasegawa, Jun-ichi Arami, Hiromi Harada | 1994-02-22 |
| 5259923 | Dry etching method | Masaru Hori, Keiji Horioka, Masao Ito, Masahito Hiratsuka, Yoshio Ishikawa | 1993-11-09 |
| 5258332 | Method of manufacturing semiconductor devices including rounding of corner portions by etching | Keiji Horioka, Hirotaka Nishino | 1993-11-02 |
| 5240554 | Method of manufacturing semiconductor device | Masaru Hori, Hiroyuki Yano, Keiji Horioka, Hisataka Hayashi, Sadayuki Jimbo | 1993-08-31 |
| 5236556 | Plasma apparatus | Takashi Yokota, Shiro Koyama, Isahiro Hasegawa | 1993-08-17 |
| 5236562 | Method for discharging hydrogen from a vacuum vessel using a roughing vacuum pump and a turbo-molecular pump | Katsuya Okumura, Manabu Tsujimura, Akio Shibata | 1993-08-17 |
| 5223113 | Apparatus for forming reduced pressure and for processing object | Satoshi Kaneko, Taichi Fugita, Toshihisa Nozawa, Yoichi Ueda, Yukimasa Yoshida +1 more | 1993-06-29 |
| 5221403 | Support table for plate-like body and processing apparatus using the table | Toshihisa Nozawa, Junichi Arami, Isahiro Hasegawa | 1993-06-22 |
| 5192714 | Method of manufacturing a multilayered metallization structure in which the conductive layer and insulating layer are selectively deposited | Kyoichi Suguro | 1993-03-09 |
| 5156881 | Method for forming a film on a substrate by activating a reactive gas | Sadahisa Noguchi, Makoto Sekine | 1992-10-20 |
| 5147497 | Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied | Toshihisa Nozawa, Osamu Kamikanda, Yukimasa Yoshida | 1992-09-15 |
| 5112645 | Phototreating method and apparatus therefor | Makoto Sekine, Yasuhiro Horiike | 1992-05-12 |
| 5094879 | Method of activating at least one gas to produce different charged species, selecting specific species, decelerating the species, and chemically reacting the species to form a thin film | Tetsuo Matsuda, Tokuhisa Ohiwa | 1992-03-10 |