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Inspection method and apparatus and lithographic processing cell |
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Inspection method and apparatus and lithographic processing cell |
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2022-09-06 |
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Metrology method, target and substrate |
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Metrology method, patterning device, apparatus and computer program |
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Metrology method, target and substrate |
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2021-12-21 |
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Method and apparatus for inspection and metrology |
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2021-11-09 |
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Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program |
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Metrology method, patterning device, apparatus and computer program |
Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar +6 more |
2021-05-04 |
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Method and apparatus to correct for patterning process error |
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Metrology method, target and substrate |
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Determining edge roughness parameters |
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2020-04-28 |
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Metrology method, target and substrate |
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Metrology method and inspection apparatus, lithographic system and device manufacturing method |
Hendrik Jan Hidde Smilde, Arno Jan Bleeker, Willem Marie Julia Marcel Coene, Patrick Warnaar |
2018-04-17 |
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Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system |
Irina Lyulina, Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers |
2016-09-27 |
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Substrate and patterning device for use in metrology, metrology method and device manufacturing method |
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Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods |
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2016-03-22 |
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Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell |
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2015-10-20 |
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Metrology method and apparatus, and device manufacturing method |
Armand Eugene Albert Koolen, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Peter Clement Paul Vanoppen |
2015-10-13 |
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Metrology method and inspection apparatus, lithographic system and device manufacturing method |
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2015-09-22 |
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Methods and scatterometers, lithographic systems, and lithographic processing cells |
Hugo Augustinus Joseph Cramer, Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Hendrik Jan Hidde Smilde, Adrianus Johannes Hendrikus Schellekens |
2015-07-14 |
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Metrology method and apparatus, and device manufacturing method |
Patrick Warnaar, Mark Van Schijndel |
2015-06-30 |
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Methods and scatterometers, lithographic systems, and lithographic processing cells |
Hugo Augustinus Joseph Cramer, Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Hendrik Jan Hidde Smilde, Adrianus Johannes Hendrikus Schellekens |
2015-03-31 |
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Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods |
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2015-03-10 |
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Method and apparatus for determining an overlay error |
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2014-12-09 |
