Issued Patents All Time
Showing 101–125 of 241 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11029206 | Methods and apparatus for waveguide metrology | Jinxin FU, Rutger Meyer Timmerman Thijssen | 2021-06-08 |
| 10954594 | High temperature vapor delivery system and method | Viachslav Babayan, Qiwei Liang, Tobin Kaufman-Osborn, Srinivas D. Nemani | 2021-03-23 |
| 10955606 | Method of imprinting tilt angle light gratings | Michael Y. Young, Robert Jan Visser, Wayne MCMILLAN | 2021-03-23 |
| 10943779 | Method and system for three-dimensional (3D) structure fill | Ellie Yieh, Srinivas D. Nemani, Er-Xuan Ping, Gary E. Dickerson | 2021-03-09 |
| 10935799 | Optical component having depth modulated angled gratings and method of formation | Rutger Meyer Timmerman Thijssen, Morgan Evans, Joseph C. Olson | 2021-03-02 |
| 10927449 | Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment | Jingjing Liu, Srinivas D. Nemani, Yongmei Chen, Anantha K. Subramani | 2021-02-23 |
| 10930472 | Methods for forming a metal silicide interconnection nanowire structure | Bencherki Mebarki, Annamalai Lakshmanan, Kaushal K. Singh, Andrew Cockburn, Paul F. Ma +1 more | 2021-02-23 |
| 10921721 | Measurement system and grating pattern array | Jinxin FU, Yifei Wang, Yongan Xu | 2021-02-16 |
| 10845715 | Post exposure processing apparatus | Viachslav Babayan, Kyle M. Hanson, Robert B. Moore | 2020-11-24 |
| 10825665 | Directional treatment for multi-dimensional device processing | Huixiong Dai, Srinivas D. Nemani, Ellie Yieh, Nitin K. Ingle | 2020-11-03 |
| 10818472 | Methods of optical device fabrication using an electron beam apparatus | Rutger Meyer Timmerman Thijssen, Kartik Ramaswamy, Yang Yang, Manivannan Thothadri, Chien-An Chen | 2020-10-27 |
| 10811303 | Methods for gapfill in high aspect ratio structures | Pramit Manna, Rui Cheng, Erica Chen, Ziqing Duan, Abhijit Basu Mallick +1 more | 2020-10-20 |
| 10801890 | Measurement system and a method of diffracting light | Jinxin FU, Yifei Wang, Ian McMackin, Rutger Meyer Timmerman Thijssen | 2020-10-13 |
| 10775158 | System and method for detecting etch depth of angled surface relief gratings | Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Morgan Evans | 2020-09-15 |
| 10770292 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2020-09-08 |
| 10705268 | Gap fill of imprinted structure with spin coated high refractive index material for optical components | Jinxin FU, Wayne MCMILLAN | 2020-07-07 |
| 10707118 | Multi stack optical elements using temporary and permanent bonding | Wayne MCMILLAN, Rutger Meyer Timmerman Thijssen, Naamah ARGAMAN, Tapashree Roy, Sage Toko Garrett DOSHAY | 2020-07-07 |
| 10636705 | High pressure annealing of metal gate structures | Yifei Wang, Kurtis Leschkies, Fei Wang, Xin Liu, Wei V. Tang +2 more | 2020-04-28 |
| 10615058 | Apparatus for field guided acid profile control in a photoresist layer | Christine Y Ouyang, Viachslav Babayan | 2020-04-07 |
| 10593592 | Laminate and core shell formation of silicide nanowire | Bencherki Mebarki, Annamalai Lakshmanan, Kaushal K. Singh, Paul F. Ma, Mehul Naik +1 more | 2020-03-17 |
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-11-12 |
| 10401742 | Post exposure processing apparatus | Viachslav Babayan, Kyle M. Hanson, Robert B. Moore | 2019-09-03 |
| 10377665 | Modifying bulk properties of a glass substrate | Joseph C. Olson, Gary E. Dickerson | 2019-08-13 |
| 10358715 | Integrated cluster tool for selective area deposition | Tobin Kaufman-Osborn, Srinivas D. Nemani, Qiwei Liang, Adib Khan | 2019-07-23 |
| 10276369 | Material deposition for high aspect ratio structures | Jun Xue, Martin A. Hilkene, Matthew D. Scotney-Castle | 2019-04-30 |