Issued Patents All Time
Showing 76–100 of 241 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11512385 | Method of forming gratings | Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Morgan Evans, Jinxin FU | 2022-11-29 |
| 11487058 | Method for manufacturing optical device structures | Levent Colak, Andre P. Labonte | 2022-11-01 |
| 11488856 | Methods for gapfill in high aspect ratio structures | Pramit Manna, Rui Cheng, Erica Chen, Ziqing Duan, Abhijit Basu Mallick +1 more | 2022-11-01 |
| 11473191 | Method for creating a dielectric filled nanostructured silica substrate for flat optical devices | Tapashree Roy, Rutger Meyer Timmerman Thijssen, Jinxin FU | 2022-10-18 |
| 11462386 | Electron beam apparatus for optical device fabrication | Kartik Ramaswamy, Yang Yang, Manivannan Thothadri, Chien-An Chen, Rutger Meyer Timmerman Thijssen | 2022-10-04 |
| 11437559 | Method and apparatus for deposition of multilayer device with superconductive film | Mingwei Zhu, Zihao Yang, Nag B. Patibandla, Yong Cao, Daniel Lee Diehl +1 more | 2022-09-06 |
| 11430634 | Methods of optical device fabrication using an electron beam apparatus | Rutger Meyer Timmerman Thijssen, Kartik Ramaswamy, Yang Yang, Manivannan Thothadri, Chien-An Chen | 2022-08-30 |
| 11372149 | Depth-modulated slanted gratings using gray-tone lithography and slant etch | Rutger Meyer Timmerman Thijssen | 2022-06-28 |
| 11333896 | Fabrication of diffraction gratings | Wayne MCMILLAN, Rutger Meyer Timmerman Thijssen | 2022-05-17 |
| 11289361 | Patterned chuck for double-sided processing | Rutger Meyer Timmerman Thijssen | 2022-03-29 |
| 11262662 | Post exposure processing apparatus | Viachslav Babayan, Kyle M. Hanson, Robert B. Moore | 2022-03-01 |
| 11237485 | System, software application, and method for lithography stitching | Yongan Xu, Christopher Dennis Bencher, Robert Jan Visser | 2022-02-01 |
| 11226439 | System and method for forming surface relief gratings | Joseph C. Olson, Costel Biloiu | 2022-01-18 |
| 11226556 | Patterning of multi-depth optical devices | Chien-An Chen, Brian Alexander Cohen, Wayne MCMILLAN, Ian McMackin | 2022-01-18 |
| 11226440 | Mask orientation | Yongan Xu, Rutger Meyer Timmerman Thijssen, Jinrui GUO | 2022-01-18 |
| 11222809 | Patterned vacuum chuck for double-sided processing | Joseph Yudovsky, Visweswaren Sivaramakrishnan, Rutger Meyer Timmerman Thijssen | 2022-01-11 |
| 11205978 | Handling and processing double-sided devices on fragile substrates | Wayne MCMILLAN, Visweswaren Sivaramakrishnan, Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Naamah ARGAMAN | 2021-12-21 |
| 11193198 | Methods of forming devices on a substrate | Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Morgan Evans, Jinxin FU | 2021-12-07 |
| 11187836 | Method of building a 3D functional optical material layer stacking structure | Michael Y. Young, Robert Jan Visser, Naamah ARGAMAN, Christopher Dennis Bencher, Wayne MCMILLAN | 2021-11-30 |
| 11171010 | Controlled hardmask shaping to create tapered slanted fins | Rutger Meyer Timmerman Thijssen | 2021-11-09 |
| 11112697 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2021-09-07 |
| 11112694 | Methods of forming variable-depth device structures | Andre P. Labonte, Rutger Meyer Timmerman Thijssen | 2021-09-07 |
| 11111176 | Methods and apparatus of processing transparent substrates | Yongan Xu, Chien-An Chen | 2021-09-07 |
| 11066747 | Chemical delivery chamber for self-assembled monolayer processes | Qiwei Liang, Adib Khan, Tobin Kaufman-Osborn, Srinivas D. Nemani | 2021-07-20 |
| 11043437 | Transparent substrate with light blocking edge exclusion zone | Michael Y. Young, Robert Jan Visser | 2021-06-22 |