Issued Patents All Time
Showing 51–75 of 241 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11815823 | Alignment mark for front to back side alignment and lithography for optical device fabrication | Yongan Xu | 2023-11-14 |
| 11807008 | Multifunctional printhead service station with multi-axis motions | Daihua Zhang, Kang Luo, Kazuya Daito, Kenneth S. Ledford, Elsa Massonneau +5 more | 2023-11-07 |
| 11810755 | Ion beam source for optical device fabrication using a segmented ion source having one or more angled surfaces | Joseph C. Olson, Rutger Meyer Timmerman Thijssen | 2023-11-07 |
| 11802791 | Optical device metrology systems and related methods | Jinxin FU, Kazuya Daito | 2023-10-31 |
| 11778926 | Method and apparatus for deposition of multilayer device with superconductive film | Mingwei Zhu, Zihao Yang, Nag B. Patibandla, Yong Cao, Daniel Lee Diehl +1 more | 2023-10-03 |
| 11764099 | Patterned chuck for double-sided processing | Rutger Meyer Timmerman Thijssen | 2023-09-19 |
| 11754919 | Lithography method to form structures with slanted angle | Yongan Xu, Jinxin FU, Jhenghan YANG | 2023-09-12 |
| 11748875 | See-through metrology systems, apparatus, and methods for optical devices | Yangyang SUN, Jinxin FU, Kazuya Daito | 2023-09-05 |
| 11739418 | Method and apparatus for deposition of metal nitrides | Mingwei Zhu, Zihao Yang, Nag B. Patibandla, Yong Cao, Daniel Lee Diehl +1 more | 2023-08-29 |
| 11735420 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2023-08-22 |
| 11733533 | Fabrication of diffraction gratings | Wayne MCMILLAN, Rutger Meyer Timmerman Thijssen | 2023-08-22 |
| 11725274 | Integrated cluster tool for selective area deposition | Tobin Kaufman-Osborn, Srinivas D. Nemani, Qiwei Liang, Adib Khan | 2023-08-15 |
| 11681083 | Photoresist loading solutions for flat optics fabrication | Sage Toko Garrett DOSHAY, Rutger Meyer Timmerman Thijssen, Chien-An Chen, Pinkesh Rohit SHAH | 2023-06-20 |
| 11669012 | Maskless lithography method to fabricate topographic substrate | Yongan Xu | 2023-06-06 |
| 11640898 | Methods of optical device fabrication using an ion beam source | Joseph C. Olson, Rutger Meyer Timmerman Thijssen | 2023-05-02 |
| 11630251 | Mask orientation | Yongan Xu, Rutger Meyer Timmerman Thijssen, Jinrui GUO | 2023-04-18 |
| 11629402 | Atomic layer deposition on optical structures | Jinrui GUO, Rutger Meyer Timmerman Thijssen | 2023-04-18 |
| 11626321 | Multi stack optical elements using temporary and permanent bonding | Wayne MCMILLAN, Rutger Meyer Timmerman Thijssen, Naamah ARGAMAN, Tapashree Roy, Sage Toko Garrett DOSHAY | 2023-04-11 |
| 11614685 | Patterning of multi-depth optical devices | Chien-An Chen, Brian Alexander Cohen, Wayne MCMILLAN, Ian McMackin | 2023-03-28 |
| 11610925 | Imaging system and method of creating composite images | Jinxin FU, Yongan Xu, Naamah ARGAMAN, Robert Jan Visser | 2023-03-21 |
| 11608558 | Multi-depth film for optical devices | Karl J. Armstrong, Brian Alexander Cohen, Wayne MCMILLAN, James D. Strassner, Benjamin B. Riordon | 2023-03-21 |
| 11581189 | Controlled hardmask shaping to create tapered slanted fins | Rutger Meyer Timmerman Thijssen | 2023-02-14 |
| 11572619 | Method of thin film deposition in trenches | Jinrui GUO, Rutger Meyer Timmerman Thijssen, Yongan Xu, Jhenghan YANG, Chien-An Chen | 2023-02-07 |
| 11557987 | Handling and processing double-sided devices on fragile substrates | Wayne MCMILLAN, Visweswaren Sivaramakrishnan, Joseph C. Olson, Rutger Meyer Timmerman Thijssen, Naamah ARGAMAN | 2023-01-17 |
| 11524392 | Minimal contact gripping of thin optical devices | Yaseer Arafath Ahamed, Kangkang Wang, Benjamin B. Riordon, James D. Strassner | 2022-12-13 |