Issued Patents All Time
Showing 76–100 of 106 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8871650 | Post etch treatment (PET) of a low-K dielectric film | Srinivas D. Nemani, Nicolas Bright, Yifeng Zhou, Jamie Saephan, Ellie Yieh | 2014-10-28 |
| 8709953 | Pulsed plasma with low wafer temperature for ultra thin layer etches | Klaus Schuegraf, Dmitry Lubomirsky | 2014-04-29 |
| 8617347 | Vacuum processing chambers incorporating a moveable flow equalizer | Jisoo Kim | 2013-12-31 |
| 8382999 | Pulsed plasma high aspect ratio dielectric process | Ankur Agarwal, Kenneth S. Collins, Shahid Rauf, Kartik Ramaswamy | 2013-02-26 |
| 8274645 | Method and apparatus for in-situ metrology of a workpiece disposed in a vacuum processing chamber | Matthew F. Davis, Lei Lian | 2012-09-25 |
| 8232212 | Within-sequence metrology based process tuning for adaptive self-aligned double patterning | Matthew F. Davis, Lei Lian | 2012-07-31 |
| 8101525 | Method for fabricating a semiconductor device having a lanthanum-family-based oxide layer | Meihua Shen, Noel Sun, Nicolas Gani, Han-Hsiang Chen, Eric Pei +3 more | 2012-01-24 |
| 8089046 | Method and apparatus for calibrating mass flow controllers | Matthew F. Davis, Quentin Ernie Walker | 2012-01-03 |
| 7846845 | Integrated method for removal of halogen residues from etched substrates in a processing system | Kenneth J. Bahng, Matthew F. Davis, Steven H. Kim | 2010-12-07 |
| 7754610 | Process for etching tungsten silicide overlying polysilicon particularly in a flash memory | Kyeong-Tae Lee, Jinhan Choi, Bi Jang, Shashank Deshmukh, Meihua Shen +1 more | 2010-07-13 |
| 7122125 | Controlled polymerization on plasma reactor wall | Shashank Deshmukh | 2006-10-17 |
| 7067432 | Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing | Songlin Xu | 2006-06-27 |
| 6924191 | Method for fabricating a gate structure of a field effect transistor | Wei Liu, David Mui, Christopher Dennis Bencher | 2005-08-02 |
| 6914009 | Method of making small transistor lengths | Jitske Kretz | 2005-07-05 |
| 6905800 | Etching a substrate in a process zone | Stephen Yuen, Mohit Jain | 2005-06-14 |
| 6872322 | Multiple stage process for cleaning process chambers | Waiching Chow, Raney Williams, Arthur Y. Chen | 2005-03-29 |
| 6827869 | Method of micromachining a multi-part cavity | Dragan Podlesnik, Jeff Chinn, Shaoher X. Pan, Anisul Khan, Maocheng Li +1 more | 2004-12-07 |
| 6824813 | Substrate monitoring method and apparatus | Michael N. Grimbergen, Jitske Trevor, Wei-Nan Jiang, Jeffrey D. Chinn | 2004-11-30 |
| 6660127 | Apparatus for plasma etching at a constant etch rate | Padmapani Nallan, John Holland, Valentin Todorov | 2003-12-09 |
| 6656283 | Channelled chamber surface for a semiconductor substrate processing chamber | — | 2003-12-02 |
| 6632321 | Method and apparatus for monitoring and controlling wafer fabrication process | David Mui, Michael N. Grimbergen | 2003-10-14 |
| 6613682 | Method for in situ removal of a dielectric antireflective coating during a gate etch process | Mohit Jain, Jeff Chinn | 2003-09-02 |
| 6583065 | Sidewall polymer forming gas additives for etching processes | Raney Williams, Jeffrey D. Chinn, Jitske Trevor, Padmapani Nallan, Tamas Varga +1 more | 2003-06-24 |
| 6518190 | Plasma reactor with dry clean apparatus and method | Jeffrey D. Chinn | 2003-02-11 |
| 6406924 | Endpoint detection in the fabrication of electronic devices | Michael N. Grimbergen | 2002-06-18 |