Issued Patents All Time
Showing 176–200 of 296 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5888876 | Deep trench filling method using silicon film deposition and silicon migration | Jun-ichi Shiozawa, Yoshitaka Tsunashima | 1999-03-30 |
| 5885138 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Riichirou Aoki, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 1999-03-23 |
| 5879863 | Pattern forming method | Tsukasa Azuma, Masaki Narita | 1999-03-09 |
| 5876273 | Apparatus for polishing a wafer | Hiroyuki Yano, Norio Kimura, Tomoyuki Yahiro, Hozumi Yasuda | 1999-03-02 |
| 5849089 | Evaporator for liquid raw material and evaporation method therefor | Yoshitaka Tsunashima | 1998-12-15 |
| 5818217 | Electron beam irradiating apparatus and electric signal detecting apparatus | Fumio Komatsu, Motosuke Miyoshi | 1998-10-06 |
| 5807650 | Photo mask and apparatus for repairing photo mask | Haruki Komano, Hiroko Nakamura, Munehiro Ogasawara, Satoshi Masuda, Yoji Ogawa | 1998-09-15 |
| 5759746 | Fabrication process using a thin resist | Tsukasa Azuma, Tokuhisa Ohiwa, Tetsuo Matsuda, David M. Dobuzinsky | 1998-06-02 |
| 5746581 | Method and apparatus for evacuating vacuum system | Yuuichi Mikata, Manabu Tsujimura, Yoshio Ando | 1998-05-05 |
| 5744293 | Semiconductor device having antireflective layer containing organic resin with dispersed carbon particles | Tsuyoshi Shibata | 1998-04-28 |
| 5724144 | Process monitoring and thickness measurement from the back side of a semiconductor body | Karl Paul Muller, Theodore G. van Kessel | 1998-03-03 |
| 5721173 | Method of forming a shallow trench isolation structure | Hiroyuki Yano | 1998-02-24 |
| 5702529 | Method of making doped semiconductor film having uniform impurity concentration on semiconductor substrate and apparatus for making the same | Yuuichi Mikata, Katsunori Ishihara | 1997-12-30 |
| 5679610 | Method of planarizing a semiconductor workpiece surface | Tetsuo Matsuda | 1997-10-21 |
| 5679484 | Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask | Shinichi Ito, Haruo Okano, Toru Watanabe | 1997-10-21 |
| 5660744 | Plasma generating apparatus and surface processing apparatus | Makoto Sekine, Keiji Horioka, Haruo Okano, Isahiro Hasegawa, Masaki Narita | 1997-08-26 |
| 5660671 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more | 1997-08-26 |
| 5643056 | Revolving drum polishing apparatus | Masayoshi Hirose, Seiji Ishikawa, Norio Kimura, Yoshimi Sasaki, Kouki Yamada +2 more | 1997-07-01 |
| 5639308 | Plasma apparatus | Yuichiro Yamazaki, Motosuke Miyoshi | 1997-06-17 |
| 5639699 | Focused ion beam deposition using TMCTS | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Keiji Horioka, Mitsuyo Kariya +7 more | 1997-06-17 |
| 5637153 | Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus | Reiji Niino, Yoshiyuki Fujita, Hideki Lee, Yasuo Imamura, Toshiharu Nishimura +4 more | 1997-06-10 |
| 5636258 | In-situ temperature measurement using X-ray diffraction | James G. Ryan, Gregory Brian Stephenson, Hans-Joerg Timme | 1997-06-03 |
| 5633207 | Method of forming a wiring layer for a semiconductor device | Hiroyuki Yano | 1997-05-27 |
| 5620815 | Exposure mask, exposure mask substrate, method for fabricating the same, and method for forming pattern based on exposure mask | Shinichi Ito, Haruo Okano, Toru Watanabe | 1997-04-15 |
| 5616063 | Polishing apparatus | Riichirou Aoki, Hiromi Yajima, Masako Kodera, Shirou Mishima, Atsushi Shigeta +3 more | 1997-04-01 |