ML

Michael Lane

IBM: 38 patents #2,506 of 70,183Top 4%
CM Chartered Semiconductor Manufacturing: 1 patents #419 of 840Top 50%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Somers, NY: #26 of 237 inventorsTop 15%
🗺 New York: #2,841 of 115,490 inventorsTop 3%
Overall (All Time): #86,951 of 4,157,543Top 3%
38
Patents All Time

Issued Patents All Time

Showing 26–38 of 38 patents

Patent #TitleCo-InventorsDate
7300867 Dual damascene interconnect structures having different materials for line and via conductors Jeffrey P. Gambino, Edward C. Cooney, III, Anthony K. Stamper, William T. Motsiff, Andrew H. Simon 2007-11-27
7276787 Silicon chip carrier with conductive through-vias and method for fabricating same Daniel C. Edelstein, Paul S. Andry, Leena Paivikki Buchwalter, Jon A. Casey, Sherif A. Goma +9 more 2007-10-02
7214608 Interlevel dielectric layer and metal layer sealing Matthew S. Angyal, Peter Biolsi, Lawrence A. Clevenger, Habib Hichri, Bernd Kastenmeier +3 more 2007-05-08
7119018 Copper conductor Stefanie Chiras, Terry A. Spooner, Robert Rosenberg, Daniel C. Edelstein 2006-10-10
7109093 Crackstop with release layer for crack control in semiconductors John A. Fitzsimmons, Vincent J. McGahay, Thomas M. Shaw, Anthony K. Stamper 2006-09-19
7102232 Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layer Lawrence A. Clevenger, Stefanie Chiras, Timothy J. Dalton, James J. Demarest, Derren N. Dunn +7 more 2006-09-05
7084479 Line level air gaps Shyng-Tsong Chen, Stefanie Chiras, Matthew E. Colburn, Timothy J. Dalton, Jeffrey Hedrick +9 more 2006-08-01
6974531 Method for electroplating on resistive substrates Panayotis Andricacos, Hariklia Deligianni, Wilma Jean Horkans, Keith Kwietniak, Sandra G. Malhotra +4 more 2005-12-13
6972209 Stacked via-stud with improved reliability in copper metallurgy Birendra Agarwala, Conrad A. Barile, Hormazdyar M. Dalal, Brett H. Engle, Ernest N. Levine +8 more 2005-12-06
6958540 Dual damascene interconnect structures having different materials for line and via conductors Jeffrey P. Gambino, Edward C. Cooney, III, Anthony K. Stamper, William T. Motsiff, Andrew H. Simon 2005-10-25
6812143 Process of forming copper structures Fenton R. McFeely, Conal E. Murray, Robert Rosenberg 2004-11-02
6787912 Barrier material for copper structures Fenton R. McFeely, Conal E. Murray, Robert Rosenberg 2004-09-07
6764774 Structures with improved adhesion to Si and C containing dielectrics and method for preparing the same Alfred Grill, Vishnubhai V. Patel 2004-07-20