TI

Tetsuya Ishikawa

Applied Materials: 89 patents #54 of 7,310Top 1%
Canon: 38 patents #1,203 of 19,416Top 7%
Honda Motor Co.: 20 patents #634 of 21,052Top 4%
KM Konica Minolta: 16 patents #84 of 2,718Top 4%
Nichia: 14 patents #120 of 1,531Top 8%
KM Konica Minolta: 12 patents #131 of 1,361Top 10%
DL Daito Electric Machine Industry Company Limited: 7 patents #3 of 17Top 20%
SC Sokudo Co.: 7 patents #7 of 74Top 10%
Apple: 5 patents #5,407 of 18,612Top 30%
HI Hitachi: 5 patents #7,555 of 28,497Top 30%
HC Hitachi Engineering Co.: 5 patents #21 of 572Top 4%
HC Hitachi Ibaraki Business Engineering Co.: 5 patents #1 of 9Top 15%
NI Ngk Insulators: 5 patents #566 of 2,083Top 30%
YE Yokogawa Electric: 5 patents #137 of 1,441Top 10%
JL Japan Aviation Electronics Industry, Limited: 4 patents #242 of 728Top 35%
JT Jtekt: 4 patents #427 of 1,969Top 25%
TC Ts Tech Co.: 3 patents #188 of 561Top 35%
TC Toshiba Carrier: 3 patents #14 of 163Top 9%
KO Konica: 2 patents #962 of 1,958Top 50%
KU Kyoto University: 2 patents #286 of 1,688Top 20%
AB Asml Netherlands B.V.: 2 patents #1,484 of 3,192Top 50%
SC Sumitomo Bakelite Co.: 2 patents #227 of 790Top 30%
Bridgestone: 1 patents #1,586 of 2,860Top 60%
SH Shiroki: 1 patents #86 of 172Top 50%
AK Aisan Kogyo Kabushiki Kaisha: 1 patents #344 of 642Top 55%
TO Toyota: 1 patents #15,335 of 26,838Top 60%
NC Ngk Ceramic Device Co.: 1 patents #9 of 20Top 45%
AC Arai Seisakusho Co: 1 patents #1 of 39Top 3%
📍 Kasugai, CA: #1 of 2 inventorsTop 50%
Overall (All Time): #1,965 of 4,157,543Top 1%
251
Patents All Time

Issued Patents All Time

Showing 176–200 of 251 patents

Patent #TitleCo-InventorsDate
6869896 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2005-03-22
6853141 Capacitively coupled plasma reactor with magnetic plasma control Daniel J. Hoffman, Matthew L. Miller, Jang-Gyoo Yang, Heeyeop Chae, Michael Barnes +1 more 2005-02-08
D501448 Electrical connector 2005-02-01
6833052 Deposition chamber and method for depositing low dielectric constant films Shijian Li, Yaxin Wang, Fred C. Redeker, Alan W. Collins 2004-12-21
6814814 Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates Alan W. Collins, Feng Gao, Padmanaban Krishnaraj, Yaxin Wang 2004-11-09
6776875 Semiconductor substrate support assembly having lobed o-rings therein Rudolf Gujer, Thomas Cho 2004-08-17
6768878 Image forming method and image forming apparatus utilizing a control patch Toru Komatsu, Hirotaka Kabashima, Toru Yamaguchi 2004-07-27
6759624 Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber Ananda H. Kumar, Kwok Manus Wong, Farahmand Askarinam 2004-07-06
6734115 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2004-05-11
6722761 Inkjet recording head and inkjet recording device Shinya Asano, Yukuo Yamaguchi 2004-04-20
6709218 Robot blade for semiconductor processing equipment Frederik W. Freerks, Timothy Wang, Jeffrey C. Hudgens, James R. Ciulik, Mohsen Salek +2 more 2004-03-23
6667527 Temperature sensor with shell Brian Lue, Liang Wang 2003-12-23
6660662 Method of reducing plasma charge damage for plasma processes Alexandros T. Demos, Seon-Mee Cho, Feng Gao, Kaveh Niazi, Michio Aruga 2003-12-09
6660656 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-12-09
6656286 Pedestal with a thermally controlled platen Thomas Cho 2003-12-02
6639962 Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel Kunio Enomoto, Katsuhiko Hirano, Eisaku Hayashi, Ren Morinaka, Sadato Shimizu +2 more 2003-10-28
6596653 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD Zhengquan Tan, Dongqing Li, Walter Zygmunt 2003-07-22
6596655 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-07-22
6589610 Deposition chamber and method for depositing low dielectric constant films Shijian Li, Yaxin Wang, Fred C. Redeker, Alan W. Collins 2003-07-08
6572708 Semiconductor wafer support lift-pin assembly Rudolf Gujer, Thomas Cho, Lily Pang, Michael P. Karazim 2003-06-03
6562690 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-05-13
6545420 Plasma reactor using inductive RF coupling, and processes Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +6 more 2003-04-08
6541282 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-04-01
6523563 Modular gas panel closet for a semiconductor wafer processing platform Thomas Cho, Robert Navasca 2003-02-25
6519991 Water jet peening apparatus Katsuhiko Hirano, Kunio Enomoto, Eisaku Hayashi, Sadato Shimizu, Ren Morinaka +2 more 2003-02-18