TI

Tetsuya Ishikawa

Applied Materials: 89 patents #54 of 7,310Top 1%
Canon: 38 patents #1,203 of 19,416Top 7%
Honda Motor Co.: 20 patents #634 of 21,052Top 4%
KM Konica Minolta: 16 patents #84 of 2,718Top 4%
Nichia: 14 patents #120 of 1,531Top 8%
KM Konica Minolta: 12 patents #131 of 1,361Top 10%
DL Daito Electric Machine Industry Company Limited: 7 patents #3 of 17Top 20%
SC Sokudo Co.: 7 patents #7 of 74Top 10%
Apple: 5 patents #5,407 of 18,612Top 30%
HI Hitachi: 5 patents #7,555 of 28,497Top 30%
HC Hitachi Engineering Co.: 5 patents #21 of 572Top 4%
HC Hitachi Ibaraki Business Engineering Co.: 5 patents #1 of 9Top 15%
NI Ngk Insulators: 5 patents #566 of 2,083Top 30%
YE Yokogawa Electric: 5 patents #137 of 1,441Top 10%
JL Japan Aviation Electronics Industry, Limited: 4 patents #242 of 728Top 35%
JT Jtekt: 4 patents #427 of 1,969Top 25%
TC Ts Tech Co.: 3 patents #188 of 561Top 35%
TC Toshiba Carrier: 3 patents #14 of 163Top 9%
KO Konica: 2 patents #962 of 1,958Top 50%
KU Kyoto University: 2 patents #286 of 1,688Top 20%
AB Asml Netherlands B.V.: 2 patents #1,484 of 3,192Top 50%
SC Sumitomo Bakelite Co.: 2 patents #227 of 790Top 30%
Bridgestone: 1 patents #1,586 of 2,860Top 60%
SH Shiroki: 1 patents #86 of 172Top 50%
AK Aisan Kogyo Kabushiki Kaisha: 1 patents #344 of 642Top 55%
TO Toyota: 1 patents #15,335 of 26,838Top 60%
NC Ngk Ceramic Device Co.: 1 patents #9 of 20Top 45%
AC Arai Seisakusho Co: 1 patents #1 of 39Top 3%
📍 Kasugai, CA: #1 of 2 inventorsTop 50%
Overall (All Time): #1,965 of 4,157,543Top 1%
251
Patents All Time

Issued Patents All Time

Showing 226–250 of 251 patents

Patent #TitleCo-InventorsDate
6143078 Gas distribution system for a CVD processing chamber Padmanabhan Krishnaraj, Feng Gao, Alan W. Collins, Lily Pang 2000-11-07
6083344 Multi-zone RF inductively coupled source configuration Hiroji Hanawa, Manus Wong, Shijian Li, Kaveh Niazi, Kenneth Smyth +3 more 2000-07-04
6070551 Deposition chamber and method for depositing low dielectric constant films Shijian Li, Yaxin Wang, Fred C. Redeker, Alan W. Collins 2000-06-06
6068784 Process used in an RF coupled plasma reactor Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +6 more 2000-05-30
6062670 Ink jet recording apparatus having discharge recovery means Kazuya Iwata, Osamu Asakura, Masasumi Nagashima, Yoshiyuki Shimamura, Kenji Kawazoe +3 more 2000-05-16
6015591 Deposition method Shijian Li, Fred C. Redeker 2000-01-18
5997120 Recording apparatus which allows ink amount detection upon exchange of a printhead Takahiro Ohde, Osamu Asakura, Masasumi Nagashima, Yoshiyuki Shimamura, Kenji Kawazoe +3 more 1999-12-07
5992961 Ink jet recording apparatus, method for determining reduced ink remains, and information processing apparatus Osamu Asakura, Masasumi Nagashima, Yoshiyuki Shimamura, Kenji Kawazoe, Kazuya Iwata +3 more 1999-11-30
5971525 Recording apparatus having a deelectrifying member for a recording head Hiroyuki Inoue, Akira Miyakawa, Soichi Hiramatsu, Hideki Yamaguchi, Kenji Kawazoe +6 more 1999-10-26
5944902 Plasma source for HDP-CVD chamber Fred C. Redeker 1999-08-31
5933174 Ink refilling system, and ink refilling apparatus and ink refilling method usable in ink refilling system Kenji Kawazoe, Akira Miyakawa, Soichi Hiramatsu, Hideki Yamaguchi, Hiroyuki Inoue +4 more 1999-08-03
5903287 Ink jet recording apparatus with simplified suction recovery device Tetsuji Kurata 1999-05-11
5886729 Sheet supplying apparatus using a flexible elastic pawl member for separating sheets one by one Soichi Hiramatsu, Atsushi Noda, Akira Miyakawa, Hideki Yamaguchi, Hiroyuki Inoue +5 more 1999-03-23
5876119 In-situ substrate temperature measurement scheme in plasma reactor Brian Lue 1999-03-02
5824607 Plasma confinement for an inductively coupled plasma reactor John Trow 1998-10-20
5818471 Recording apparatus and method for indicating decrease of ink remains Yoshiyuki Shimamura, Osamu Asakura, Masasumi Nagashima, Kenji Kawazoe, Kazuya Iwata +3 more 1998-10-06
5816723 Electronic apparatus capable of feeding sheets from a front side, and sheet feeding device for use therewith Seiji Takahashi, Osamu Asakura, Masasumi Nagashima, Yoshiyuki Shimamura, Kenji Kawazoe +3 more 1998-10-06
5800621 Plasma source for HDP-CVD chamber Fred C. Redeker 1998-09-01
5772771 Deposition chamber for improved deposition thickness uniformity Shijian Li, Fred C. Redeker 1998-06-30
5761023 Substrate support with pressure zones having reduced contact area and temperature feedback Brian Lue, Fred C. Redeker, Manus Wong, Shijian Li 1998-06-02
5583737 Electrostatic chuck usable in high density plasma Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright +2 more 1996-12-10
5572105 Stepping motor control method including varying the number of split sections in one step drive period of a stepping motor Takashi Nojima, Akira Miyakawa, Soichi Hiramatsu, Hideki Yamaguchi, Hiroyuki Inoue +4 more 1996-11-05
5556501 Silicon scavenger in an inductively coupled RF plasma reactor Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +7 more 1996-09-17
5539609 Electrostatic chuck usable in high density plasma Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright +2 more 1996-07-23
5350479 Electrostatic chuck for high power plasma processing Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Nicolas Bright +1 more 1994-09-27