Issued Patents All Time
Showing 201–225 of 251 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6518195 | Plasma reactor using inductive RF coupling, and processes | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more | 2003-02-11 |
| 6517634 | Chemical vapor deposition chamber lid assembly | Lily Pang, Thomas Cho | 2003-02-11 |
| 6511153 | Preliminary discharge acceptor mechanism and printing apparatus provided with the preliminary discharge acceptor mechanism | — | 2003-01-28 |
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more | 2002-12-03 |
| 6486081 | Gas distribution system for a CVD processing chamber | Padmanabhan Krishnaraj, Feng Gao, Alan W. Collins, Lily Pang | 2002-11-26 |
| 6447651 | High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers | Kaveh Niazi, Tsutomu Tanaka, Canfeng Lai, Robert Duncan | 2002-09-10 |
| 6425276 | Water jet peening apparatus | Katsuhiko Hirano, Kunio Enomoto, Eisaku Hayashi, Sadato Shimizu, Ren Morinaka +2 more | 2002-07-30 |
| 6416823 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Alan W. Collins | 2002-07-09 |
| 6383954 | Process gas distribution for forming stable fluorine-doped silicate glass and other films | Yaxin Wang, Diana Chan, Turgut Sahin, Farhad Moghadam | 2002-05-07 |
| 6363624 | Apparatus for cleaning a semiconductor process chamber | Lily Pang, Thomas Cho | 2002-04-02 |
| 6348725 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2002-02-19 |
| 6345083 | Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel | Kunio Enomoto, Katsuhiko Hirano, Eisaku Hayashi, Ren Morinaka, Sadato Shimizu +2 more | 2002-02-05 |
| 6341151 | Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel | Kunio Enomoto, Katsuhiko Hirano, Eisaku Hayashi, Ren Morinaka, Sadato Shimizu +2 more | 2002-01-22 |
| 6303523 | Plasma processes for depositing low dielectric constant films | David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more | 2001-10-16 |
| 6286451 | Dome: shape and temperature controlled surfaces | Pavel Staryuk, Hiroji Hanawa | 2001-09-11 |
| 6260943 | Ink-jet printing apparatus with multi-position cap | — | 2001-07-17 |
| 6251792 | Plasma etch processes | Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +7 more | 2001-06-26 |
| 6251187 | Gas distribution in deposition chambers | Shijian Li, Fred C. Redeker | 2001-06-26 |
| 6246484 | Image reading apparatus and information processing apparatus having image reading function | Yoshiyuki Shimamura | 2001-06-12 |
| 6239553 | RF plasma source for material processing | Mike Barnes, Kaveh Niazi, Tsutomu Tanaka | 2001-05-29 |
| 6214121 | Pedestal with a thermally controlled platen | Thomas Cho | 2001-04-10 |
| 6192829 | Antenna coil assemblies for substrate processing chambers | Michael P. Karazim, Rudolf Gujer, Thomas Kring, Pavel Staryuk, Abhi Desai +2 more | 2001-02-27 |
| 6189483 | Process kit | Padmanabhan Krishnaraj, Kaveh Niazi, Hiroji Hanawa | 2001-02-20 |
| 6182602 | Inductively coupled HDP-CVD reactor | Fred C. Redeker, Romuald Nowak, Troy S. Detrick, Jay D. Pinson, II | 2001-02-06 |
| 6170428 | Symmetric tunable inductively coupled HDP-CVD reactor | Fred C. Redeker, Farhad Moghadam, Hiroji Hanawa, Dan Maydan, Shijian Li +5 more | 2001-01-09 |