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Method of measuring a parameter of a patterning process, metrology apparatus, target |
Sergei Sokolov, Sergey Tarabrin, Su-Ting CHENG, Armand Eugene Albert Koolen, Koenraad Remi André Maria Schreel |
2021-10-19 |
| 10754259 |
Method and device for pupil illumination in overlay and critical dimension sensors |
Yevgeniy Konstantinovich Shmarev |
2020-08-25 |
| 10495889 |
Beam homogenizer, illumination system and metrology system |
Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov |
2019-12-03 |
| 10289006 |
Beam delivery for EUV lithography |
Jan Bernard Plechelmus Van Schoot, Hermanus Johannes Maria Kreuwel |
2019-05-14 |
| 10222702 |
Radiation source |
Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken +3 more |
2019-03-05 |
| 10222703 |
Lithographic apparatus and method |
Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Hendrikus Robertus Marie Van Greevenbroek, Paul Van Der Veen +2 more |
2019-03-05 |
| 9835950 |
Radiation source |
Niek Antonius Jacobus Maria Kleemans, Antonius Johannes Josephus Van Dijsseldonk, Ramon Mark Hofstra, Oscar Franciscus Jozephus Noordman, Tien Nang Pham +3 more |
2017-12-05 |
| 9778575 |
Lithographic apparatus and method |
Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Hendrikus Robertus Marie Van Greevenbroek, Paul Van Der Veen +2 more |
2017-10-03 |
| 9645500 |
Radiation source and lithographic apparatus |
Oscar Franciscus Jozephus Noordman |
2017-05-09 |
| 9250536 |
Lithographic apparatus and method |
Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Hendrikus Robertus Marie Greevenbroek, Patricius Aloysius Jacobus Tinnemans +2 more |
2016-02-02 |
| 9188881 |
Lithographic apparatus and method for reducing stray radiation |
Marcel Mathijs Theodore Marie Dierichs, Hendrikus Robertus Marie Van Greevenbroek, Antonie Hendrik Verweij |
2015-11-17 |
| 8937706 |
Lithographic apparatus and method |
Heine Melle Mulder, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Hendrikus Robertus Marie Van Greevenbroek, Paul Van Der Veen |
2015-01-20 |
| 8830444 |
Lithographic apparatus and method |
Jan Bernard Plechelmus Van Schoot, Igor Petrus Maria Bouchoms, Antonius Johannes Josephus Van Dijsseldonk |
2014-09-09 |
| 8680493 |
Radiation conduit for radiation source |
Maikel Adrianus Cornelis Schepers, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel +3 more |
2014-03-25 |
| 8587766 |
Lithographic apparatus and device manufacturing method |
Heine Melle Mulder |
2013-11-19 |
| 8252487 |
Device manufacturing method and mask for use therein |
Marcel Mathijs Theodore Marie Dierichs, Donis Flagello |
2012-08-28 |
| 7985515 |
Method and apparatus for performing model-based layout conversion for use with dipole illumination |
Duan-Fu Stephen Hsu, Kurt E. Wampler, Jang Fung Chen, Noel Corcoran |
2011-07-26 |
| 7856606 |
Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems |
Melchior Mulder, Thomas Laidig, Uwe Hollerbach |
2010-12-21 |
| 7666554 |
Method and apparatus for performing model-based layout conversion for use with dipole illumination |
Duan-Fu Stephen Hsu, Kurt E. Wampler, Jang Fung Chen, Noel Corcoran |
2010-02-23 |
| 7525642 |
Lithographic apparatus and device manufacturing method |
Heine Melle Mulder |
2009-04-28 |
| 7355681 |
Optical proximity correction using chamfers and rounding at corners |
Thomas Laidig |
2008-04-08 |
| 7349066 |
Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence |
Thomas Laidig, Uwe Hollerbach |
2008-03-25 |
| 7333178 |
Lithographic apparatus and device manufacturing method |
Marcel Mathijs Theodore Marie Dierichs, Hako Botma |
2008-02-19 |
| 7316870 |
Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program |
Jozef Maria Finders |
2008-01-08 |
| 7224440 |
Lithographic apparatus and device manufacturing method |
Stefan Geerte Kruijswijk, Marcel Mathijs Theodore Marie Dierichs, Heine Melle Mulder |
2007-05-29 |