Issued Patents All Time
Showing 51–75 of 96 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong +3 more | 2002-07-16 |
| 6420088 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong | 2002-07-16 |
| 6398875 | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide | John M. Cotte, Dario L. Goldfarb, Kenneth McCullough, Keith R. Pope, John P. Simons +1 more | 2002-06-04 |
| 6383712 | Polymer-bound sensitizer | Premlatha Jagannathan, Leo L. Linehan, Randolph J. Smith | 2002-05-07 |
| 6346484 | Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures | John M. Cotte, Christopher V. Jahnes, Kenneth McCullough, Satyanarayana V. Nitta, Katherine L. Saenger +1 more | 2002-02-12 |
| 6235452 | Detection of a gaseous substance emanating from a layer of polymeric composition | James Patrick Collins, Laird MacDowell, Michael Santarelli | 2001-05-22 |
| 6221568 | Developers for polychloroacrylate and polychloromethacrylate based resists | Marie Angelopoulos, Karen E. Petrillo | 2001-04-24 |
| 6210856 | Resist composition and process of forming a patterned resist layer on a substrate | Qinghuang Lin, Timothy Hughes, George M. Jordhamo, Ahmad D. Katnani, Niranjan M. Patel | 2001-04-03 |
| 6207787 | Antireflective coating for microlithography | James T. Fahey, Brian Herbst, Leo L. Linehan, Gary T. Spinillo, Kevin M. Welsh +1 more | 2001-03-27 |
| 6203965 | Photoresist comprising blends of photoacid generators | James F. Cameron, James Michael Mori, George W. Orsula, James W. Thackeray, Wu-Song Huang +3 more | 2001-03-20 |
| 6153696 | Process for forming carbonates of hydroxyaromatic compounds | Gregory Breyta, Daniel J. Dawson, Moahmoud Mostafa Khojasteh, Ranee W. Kwong, Elwood Herbert Macy +5 more | 2000-11-28 |
| 6136498 | Polymer-bound sensitizer | Premlatha Jagannathan, Leo L. Linehan, Randolph J. Smith | 2000-10-24 |
| 6132644 | Energy sensitive electrically conductive admixtures | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Kuang-Jung Chen, David E. Seeger | 2000-10-17 |
| 6107177 | Silylation method for reducing critical dimension loss and resist loss | Zhijian Lu | 2000-08-22 |
| 6074800 | Photo acid generator compounds, photo resists, and method for improving bias | Gregory Breyta, Phillip Brock, Daniel J. Dawson, Ronald A. DellaGuardia, Charlotte R. DeWan +6 more | 2000-06-13 |
| 6057080 | Top antireflective coating film | William R. Brunsvold, George J. Hefferon, Christopher F. Lyons, Robert L. Wood | 2000-05-02 |
| 6051659 | Highly sensitive positive photoresist composition | David Paul Merritt, Robert L. Wood | 2000-04-18 |
| 6051364 | Polymeric dyes for antireflective coatings | Christopher J. Knors, Elwood Herbert Macy | 2000-04-18 |
| 6043003 | E-beam application to mask making using new improved KRS resist system | James J. Bucchignano, Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Karen E. Petrillo | 2000-03-28 |
| 6037097 | E-beam application to mask making using new improved KRS resist system | James J. Bucchignano, Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Karen E. Petrillo | 2000-03-14 |
| 5955222 | Method of making a rim-type phase-shift mask and mask manufactured thereby | Michael S. Hibbs, Steven J. Holmes, Ahmad D. Katnani, Niranjan M. Patel | 1999-09-21 |
| 5930597 | Reworkable polymer chip encapsulant | Anson J. Call, Stephen L. Buchwalter, Sushumna Iruvanti, Stanley J. Jasne, Frank L. Pompeo +1 more | 1999-07-27 |
| 5821036 | Method of developing positive photoresist and compositions therefor | Stanley A. Ficner, John Magvas, Christopher F. Lyons, Marina V. Plat | 1998-10-13 |
| 5800963 | Polymeric dyes for antireflective coatings | Christopher J. Knors, Elwood Herbert Macy | 1998-09-01 |
| 5795701 | Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound | Willard E. Conley, James T. Fahey, Ratnam Sooriyakumaran, Kevin M. Welsh | 1998-08-18 |