Issued Patents All Time
Showing 26–50 of 96 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6821488 | Sample holding chuck for use in reactor and reactor using same | Kenneth McCullough, John P. Simons, Charles J. Taft | 2004-11-23 |
| 6739346 | Apparatus for cleaning filters | John M. Cotte, Kenneth McCullough, Keith R. Pope, John P. Simons, Charles J. Taft | 2004-05-25 |
| 6736906 | Turbine part mount for supercritical fluid processor | John M. Cotte, Matteo Flotta, Kenneth McCullough, Keith R. Pope, John P. Simons +1 more | 2004-05-18 |
| 6686124 | Multifunctional polymeric materials and use thereof | Marie Angelopoulos, Katherina Babich, David R. Medeiros | 2004-02-03 |
| 6685853 | Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Kuang-Jung Chen, David E. Seeger | 2004-02-03 |
| 6683008 | Process of removing ion-implanted photoresist from a workpiece | John M. Cotte, Kenneth McCullough, Keith R. Pope, John P. Simons, Charles J. Taft | 2004-01-27 |
| 6673521 | Supercritical fluid(SCF) silylation process | Kenneth McCullough, David R. Medeiros, John P. Simons, Charles J. Taft | 2004-01-06 |
| 6656666 | Topcoat process to prevent image collapse | John P. Simons, Kenneth McCullough, Charles J. Taft | 2003-12-02 |
| 6653233 | Process of providing a semiconductor device with electrical interconnection capability | John M. Cotte, Kenneth McCullough, Keith R. Pope, John P. Simons, Charles J. Taft +1 more | 2003-11-25 |
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang +1 more | 2003-11-25 |
| 6622507 | Electromechanical device and a process of preparing same | John M. Cotte, Kenneth McCullough, John P. Simons, Charles J. Taft, Richard P. Volant | 2003-09-23 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang +3 more | 2003-07-01 |
| 6579464 | Fixtures for processing a workpiece in a supercritical fluid | John M. Cotte, Matteo Flotta, Kenneth McCullough, John P. Simons, Charles J. Taft | 2003-06-17 |
| 6561220 | Apparatus and method for increasing throughput in fluid processing | Kenneth McCullough, John P. Simons, Charles J. Taft, John M. Cotte | 2003-05-13 |
| 6558475 | Process for cleaning a workpiece using supercritical carbon dioxide | Jesse Jur, Kenneth McCullough, John P. Simons, Charles J. Taft | 2003-05-06 |
| 6543617 | Packaged radiation sensitive coated workpiece process for making and method of storing same | Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros, Karen E. Petrillo +2 more | 2003-04-08 |
| 6509136 | Process of drying a cast polymeric film disposed on a workpiece | Dario L. Goldfarb, Kenneth McCullough, David R. Medeiros, John P. Simons, Charles J. Taft | 2003-01-21 |
| 6503692 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong | 2003-01-07 |
| 6495825 | Apparatus for photo exposure of materials with subsequent capturing of volatiles for analysis | Mark S. Chace, John E. Darney, David R. Medeiros, Alfred Oscar Passano | 2002-12-17 |
| 6479018 | Detection of a gaseous substance emanating from a layer of polymeric composition | James Patrick Collins, Laird MacDowell, Michael Santarelli | 2002-11-12 |
| 6457480 | Process and apparatus for cleaning filters | John M. Cotte, Kenneth McCullough, Keith R. Pope, John P. Simons, Charles J. Taft | 2002-10-01 |
| 6454869 | Process of cleaning semiconductor processing, handling and manufacturing equipment | John M. Cotte, Dario L. Goldfarb, Kenneth McCullough, Keith R. Pope, John P. Simons +1 more | 2002-09-24 |
| 6451510 | Developer/rinse formulation to prevent image collapse in resist | Scott A. Messick, Christopher F. Robinson | 2002-09-17 |
| 6451375 | Process for depositing a film on a nanometer structure | John M. Cotte, Kenneth McCullough, John P. Simons, Charles J. Taft | 2002-09-17 |
| 6425956 | Process for removing chemical mechanical polishing residual slurry | John M. Cotte, Donald J. Delehanty, Kenneth McCullough, John P. Simons, Charles J. Taft +1 more | 2002-07-30 |