Issued Patents All Time
Showing 76–96 of 96 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5783361 | Microlithographic structure with an underlayer film containing a thermolyzed azide compound | Willard E. Conley, James T. Fahey, Ratnam Sooriyakumaran, Kevin M. Welsh | 1998-07-21 |
| 5744537 | Antireflective coating films | William R. Brunsvold, George J. Hefferon, Christopher F. Lyons, Robert L. Wood | 1998-04-28 |
| 5736301 | Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used | James T. Fahey, Brian Herbst, Leo L. Linehan, Gary T. Spinillo, Kevin M. Welsh +1 more | 1998-04-07 |
| 5731385 | Polymeric dyes for antireflective coatings | Christopher J. Knors, Elwood Herbert Macy | 1998-03-24 |
| 5663036 | Microlithographic structure with an underlayer film comprising a thermolyzed azide | Willard E. Conley, James T. Fahey, Ratnam Sooriyakumaran, Kevin M. Welsh | 1997-09-02 |
| 5659203 | Reworkable polymer chip encapsulant | Anson J. Call, Stephen L. Buchwalter, Sushumna Iruvanti, Stanley J. Jasne, Frank L. Pompeo +1 more | 1997-08-19 |
| 5654376 | Polymeric dyes for antireflective coatings | Christopher J. Knors, Elwood Herbert Macy | 1997-08-05 |
| 5607824 | Antireflective coating for microlithography | James T. Fahey, Brian Herbst, Leo L. Linehan, Gary T. Spinillo, Kevin M. Welsh +1 more | 1997-03-04 |
| 5561194 | Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene | Kathleen Cornett, Judy B. Dorn, Margaret C. Lawson, Leo L. Linehan, Randolph J. Smith +1 more | 1996-10-01 |
| 5554485 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Ratnam Sooriyakumaran +3 more | 1996-09-10 |
| 5547812 | Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer | James Patrick Collins, Judy B. Dorn, James T. Fahey, Leo L. Linehan, William J. Miller +3 more | 1996-08-20 |
| 5401614 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Ratnam Sooriyakumaran +3 more | 1995-03-28 |
| 5362599 | Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds | Christopher J. Knors, Steve S. Miura, Melvin Montgomery, Randolph J. Smith | 1994-11-08 |
| 5272042 | Positive photoresist system for near-UV to visible imaging | Robert David Allen, William R. Brunsvold, Burton J. Carpenter, William D. Hinsberg, Joseph LaTorre +5 more | 1993-12-21 |
| 5240812 | Top coat for acid catalyzed resists | Willard E. Conley, Ranee W. Kwong, Richard J. Kvitek, Robert N. Lang, Christopher F. Lyons +3 more | 1993-08-31 |
| 5227280 | Resists with enhanced sensitivity and contrast | James A. Jubinsky, Steven M. Katz, Christopher F. Lyons | 1993-07-13 |
| 5164278 | Speed enhancers for acid sensitized resists | William R. Brunsvold, Christopher J. Knors, Melvin Montgomery, Kevin M. Welsh | 1992-11-17 |
| 5023164 | Highly sensitive dry developable deep UV photoresist | William R. Brunsvold, Philip Chiu, Willard E. Conley, Dale M. Crockatt, Melvin Montgomery | 1991-06-11 |
| 4942108 | Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Kaolin N. Chiong, Ming-Fea Chow, Nancy Snyder | 1990-07-17 |
| 4880722 | Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Kaolin N. Chiong | 1989-11-14 |
| 4464458 | Process for forming resist masks utilizing O-quinone diazide and pyrene | Ming-Fea Chow, Edward C. Fredericks | 1984-08-07 |