RX

Ruilong Xie

IBM: 731 patents #10 of 70,183Top 1%
Globalfoundries: 577 patents #1 of 4,424Top 1%
SS Stmicroelectronics Sa: 62 patents #8 of 1,676Top 1%
GU Globalfoundries U.S.: 29 patents #17 of 665Top 3%
GP Globalfoundries Singapore Pte.: 5 patents #141 of 828Top 20%
IN Intermolecular: 1 patents #186 of 248Top 75%
📍 Niskayuna, NY: #1 of 949 inventorsTop 1%
🗺 New York: #3 of 115,490 inventorsTop 1%
Overall (All Time): #53 of 4,157,543Top 1%
1139
Patents All Time

Issued Patents All Time

Showing 601–625 of 1,139 patents

Patent #TitleCo-InventorsDate
10529826 Forming self-aligned gate and source/drain contacts using sacrificial gate cap spacer and resulting devices Julien Frougier, Chanro Park, Kangguo Cheng 2020-01-07
10522410 Performing concurrent diffusion break, gate and source/drain contact cut etch processes Laertis Economikos, Hui Zang, Haiting Wang, Hong Yu 2019-12-31
10522658 Vertical field effect transistor having improved uniformity Kangguo Cheng, Juntao Li, Chanro Park 2019-12-31
10522538 Using source/drain contact cap during gate cut Haiting Wang, Shesh Mani Pandey, Jiehui Shu, Laertis Economikos, Hui Zang +2 more 2019-12-31
10522403 Middle of the line self-aligned direct pattern contacts Jason E. Stephens, Daniel Chanemougame, Lars Liebmann, Gregory A. Northrop 2019-12-31
10510749 Resistor within single diffusion break, and related method Hui Zang, Laertis Economikos, Garo Derderian 2019-12-17
10510622 Vertically stacked complementary-FET device with independent gate control Julien Frougier, Puneet Harischandra Suvarna 2019-12-17
10510620 Work function metal patterning for N-P space between active nanostructures Daniel Chanemougame, Steven R. Soss, Steven Bentley, Julien Frougier 2019-12-17
10505016 Self aligned gate shape preventing void formation Andrew M. Greene, Qing Liu, Chun-Chen Yeh 2019-12-10
10504798 Gate cut in replacement metal gate process Chanro Park, Laertis Economikos, Andrew M. Greene, Siva Kanakasabapathy, John R. Sporre 2019-12-10
10504790 Methods of forming conductive spacers for gate contacts and the resulting device Lars Liebmann, Bipul C. Paul, Daniel Chanemougame, Nigel G. Cave 2019-12-10
10497798 Vertical field effect transistor with self-aligned contacts Steven Bentley, Puneet Harischandra Suvarna, Chanro Park, Min Gyu Sung, Lars Liebmann +2 more 2019-12-03
10497612 Methods of forming contact structures on integrated circuit products Lars Liebmann, Balasubramanian S. Pranatharthi Haran, Veeraraghavan S. Basker 2019-12-03
10490641 Methods of forming a gate contact structure for a transistor Hao Tang, Cheng Chi, Daniel Chanemougame, Lars Liebmann, Mark V. Raymond 2019-11-26
10490455 Gate contact structures and cross-coupled contact structures for transistor devices Youngtag Woo, Daniel Chanemougame, Bipul C. Paul, Lars Liebmann, Heimanu Niebojewski +3 more 2019-11-26
10483363 Methods of forming a gate contact structure above an active region of a transistor Hao Tang, Cheng Chi, Daniel Chanemougame, Lars Liebmann, Mark V. Raymond 2019-11-19
10475899 Method of forming gate-all-around (GAA) FinFET and GAA FinFET formed thereby Andreas Knorr, Julien Frougier, Hui Zang, Min-hwa Chi 2019-11-12
10475660 Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme Cheng Chi, Fee Li Lie, Chi-Chun Liu 2019-11-12
10468525 VFET CMOS dual epitaxy integration Kangguo Cheng, Tenko Yamashita, Chun-Chen Yeh 2019-11-05
10468300 Contacting source and drain of a transistor device Andre P. Labonte, Lars Liebmann, Daniel Chanemougame, Chanro Park, Nigel G. Cave +1 more 2019-11-05
10461196 Control of length in gate region during processing of VFET structures Chanro Park, Steven Bentley, Min Gyu Sung 2019-10-29
10461186 Methods of forming vertical field effect transistors with self-aligned contacts and the resulting structures John H. Zhang, Mahender Kumar 2019-10-29
10461174 Vertical field effect transistors with self aligned gate and source/drain contacts Cheng Chi, Hao Tang 2019-10-29
10453939 Reduced capacitance in vertical transistors by preventing excessive overlap between the gate and the source/drain Kangguo Cheng, Tenko Yamashita, Chun-Chen Yeh 2019-10-22
10453736 Dielectric isolation in gate-all-around devices Robin Hsin Kuo Chao, Kangguo Cheng, Nicolas Loubet, Pietro Montanini 2019-10-22