LC

Lawrence A. Clevenger

IBM: 599 patents #13 of 70,183Top 1%
SS Stmicroelectronics Sa: 29 patents #33 of 1,676Top 2%
TE Tessera: 13 patents #34 of 271Top 15%
Globalfoundries: 13 patents #279 of 4,424Top 7%
Infineon Technologies Ag: 10 patents #1,105 of 7,486Top 15%
AS Adeia Semiconductor Solutions: 4 patents #2 of 57Top 4%
GP Globalfoundries Singapore Pte.: 3 patents #212 of 828Top 30%
ET Elpis Technologies: 3 patents #8 of 121Top 7%
KY Kyndryl: 1 patents #287 of 874Top 35%
FS Freeescale Semiconductor: 1 patents #2,021 of 3,767Top 55%
Samsung: 1 patents #49,284 of 75,807Top 70%
CM Chartered Semiconductor Manufacturing: 1 patents #419 of 840Top 50%
📍 Saratoga Springs, NY: #1 of 363 inventorsTop 1%
🗺 New York: #13 of 115,490 inventorsTop 1%
Overall (All Time): #217 of 4,157,543Top 1%
635
Patents All Time

Issued Patents All Time

Showing 201–225 of 635 patents

Patent #TitleCo-InventorsDate
10734523 Nanosheet substrate to source/drain isolation Fee Li Lie, Mona A. Ebrish, Ekmini Anuja De Silva, Indira Seshadri, Gauri Karve +2 more 2020-08-04
10734475 Stacked MIM capacitors with self-aligned contact to reduce via enclosure Takashi Ando, Robert A. Groves, Hemanth Jagannathan, Griselda Bonilla 2020-08-04
10734289 Method for forming strained fin channel devices Kangguo Cheng, Junli Wang, Carl Radens, John H. Zhang 2020-08-04
10734277 Top via back end of the line interconnect integration Chih-Chao Yang, Benjamin D. Briggs, Brent A. Anderson 2020-08-04
10727124 Structure and method for forming fully-aligned trench with an up-via integration scheme Nicholas Anthony Lanzillo, Benjamin D. Briggs 2020-07-28
10720567 Prevention of switching of spins in magnetic tunnel junctions by on-chip parasitic magnetic shield Benjamin D. Briggs, Nicholas Anthony Lanzillo, Michael Rizzolo, Theodorus E. Standaert 2020-07-21
10714389 Structure and method using metal spacer for insertion of variable wide line implantation in SADP/SAQP integration Hsueh-Chung Chen, James J. Kelly, Yann Mignot, Cornelius Brown Peethala 2020-07-14
10700214 Overturned thin film device with self-aligned gate and source/drain (S/D) contacts Carl Radens, Yiheng Xu, John H. Zhang 2020-06-30
10699950 Method of optimizing wire RC for device performance and reliability Baozhen Li, Kirk D. Peterson, John E. Sheets, II, Terry A. Spooner 2020-06-30
10699050 Front-end-of-line shape merging cell placement and optimization David Wolpert, Erwin Behnen, Patrick Watson, Chih-Chao Yang, Timothy A. Schell 2020-06-30
10681207 Caller identity verification based on unique multi-device signatures Richard C. Johnson, Spyridon Skordas 2020-06-09
10679934 Capacitance reduction in sea of lines BEOL metallization Benjamin D. Briggs, Huai Huang, Christopher J. Penny, Michael Rizzolo, Hosadurga Shobha 2020-06-09
10676216 Non-intrusive unmanned entity inspection Yuk L. Chan, Eileen P. Tedesco, Kyle E. Gilbertson, Daniel F. Hogerty, Benjamin D. Briggs 2020-06-09
10672984 Resistive memory crossbar array compatible with Cu metallization Takashi Ando, Michael Rizzolo, Shyng-Tsong Chen 2020-06-02
10658585 Dedicated contacts for controlled electroforming of memory cells in resistive random-access memory array Takashi Ando, Chih-Chao Yang, Benjamin D. Briggs 2020-05-19
10658235 Rework for metal interconnects using etch and thermal anneal Prasad Bhosale, Terry A. Spooner, Chih-Chao Yang 2020-05-19
10658233 Dielectric damage-free dual damascene Cu interconnects without barrier at via bottom Koichi Motoyama, Benjamin D. Briggs, Gangadhara Raja Muthinti, Cornelius Brown Peethala 2020-05-19
10657677 Cognitive situation-aware vision deficiency remediation Yuk L. Chan, Alain Loiseau, Deepti M. Naphade 2020-05-19
10651078 Selective ILD deposition for fully aligned via with airgap Christopher J. Penny, Benjamin D. Briggs, Huai Huang, Michael Rizzolo, Hosadurga Shobha 2020-05-12
10636738 Contacts having a geometry to reduce resistance Baozhen Li, Kirk D. Peterson, Terry A. Spooner, Junli Wang 2020-04-28
10629529 Semiconductor device including a porous dielectric layer, and method of forming the semiconductor device Benjamin D. Briggs, Bartlet H. DeProspo, Huai Huang, Christopher J. Penny, Michael Rizzolo 2020-04-21
10629478 Dual-damascene formation with dielectric spacer and thin liner Benjamin D. Briggs, Huai Huang, Christopher J. Penny, Michael Rizzolo, Hosadurga Shobha 2020-04-21
10629009 Non-intrusive unmanned entity inspection Yuk L. Chan, Eileen P. Tedesco, Kyle E. Gilbertson, Daniel F. Hogerty, Benjamin D. Briggs 2020-04-21
10622250 Dielectric gap fill evaluation for integrated circuits Isabel Cristina Chu, Leigh Anne H. Clevenger, Ekmini Anuja De Silva, Gauri Karve, Fee Li Lie +3 more 2020-04-14
10615119 Back end of line electrical fuse structure and method of fabrication Benjamin D. Briggs, Michael Rizzolo, Chih-Chao Yang 2020-04-07